Barium Oxide, Ba2O3
Barium oxide (BaO) sputtering targets from Infinita Materials provide a high-purity source of this reactive alkaline-earth oxide for research and functional thin-film deposition. Supplied by Infinita Materials in standard 1 in. and 2 in. disc formats and custom planar geometries, these targets are manufactured to a consistent density for stable sputter behaviour. Because BaO is strongly hygroscopic and reacts readily with atmospheric moisture and CO2, each target is processed, packaged, and shipped under controlled conditions to preserve surface purity before use. Purity grades from 99.9% to 99.99% support both general PVD coating work and precision oxide-film research.
| Purity (%) : | >99.9 |
| Dimensions : | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction to Barium Oxide
Barium Oxide (BaO) is a cubic rock-salt oxide (Fm-3m) with six-coordinate Ba²⁺ and O²⁻ ions, a melting point near 1923 °C, and a theoretical density of approximately 5.72 g/cm³. It is a strongly basic, moisture- and CO₂-sensitive ceramic that readily forms barium hydroxide and carbonate, requiring controlled storage and handling. As a sputtering target, BaO is primarily used as a barium source for complex oxide and mixed-metal-oxide thin films rather than standalone coatings. Magnetron sputtering enables controlled barium incorporation into barium titanate-based dielectrics, thermionic cathode coatings, vacuum getter layers, and barium-containing perovskite and superconducting oxide systems. Dense targets and prompt, moisture-controlled handling help maintain surface quality and reproducible deposition.
FAQs
Question: What are the main applications of Barium Oxide thin films?
Answer: Ba₂O₃ thin films are used in the semiconductor industry as dielectrics and capacitors, in optical coatings for anti-reflection layers and mirrors, as electron emitters in cathodes, in photocatalytic applications for environmental remediation, in thermal barrier coatings, and in battery technologies.
Question: How is Ba₂O₃ thin film deposition achieved?
Answer: Ba₂O₃ nanoparticle thin films are deposited through sputtering, where a Ba₂O₃ nanoparticle target is bombarded by high-energy ions, causing atoms or molecules to be ejected from the target and deposited on a substrate.
Introduction to Barium Oxide
Barium Oxide (BaO) is a cubic rock-salt oxide (Fm-3m) with six-coordinate Ba²⁺ and O²⁻ ions, a melting point near 1923 °C, and a theoretical density of approximately 5.72 g/cm³. It is a strongly basic, moisture- and CO₂-sensitive ceramic that readily forms barium hydroxide and carbonate, requiring controlled storage and handling. As a sputtering target, BaO is primarily used as a barium source for complex oxide and mixed-metal-oxide thin films rather than standalone coatings. Magnetron sputtering enables controlled barium incorporation into barium titanate-based dielectrics, thermionic cathode coatings, vacuum getter layers, and barium-containing perovskite and superconducting oxide systems. Dense targets and prompt, moisture-controlled handling help maintain surface quality and reproducible deposition.
Key Properties of Barium Oxide
| Property | Value | Significance |
|---|
| Chemical Formula | BaO | Confirms the stoichiometric 1:1 barium-oxygen compound rather than a peroxide or higher oxide phase |
| CAS Number | 1304-28-5 | Standard identifier for procurement, safety documentation, and customs classification |
| Molar Mass | ~153.33 g/mol | Used for target mass, deposition rate, and film thickness calculations |
| Crystal Structure | Cubic rock-salt (NaCl-type), space group Fm-3m | Simple close-packed lattice underlies the compound’s high lattice energy and high melting point |
| Theoretical Density | ~5.72 g/cm3 | Reference value for target densification checks and sputter-rate estimation |
| Melting Point | ~1923 C (2196 K) | High thermal stability supports sustained sputtering without target melting. |
| Moisture/CO2 Reactivity | Hygroscopic; reacts with H2O to form Ba(OH)2 and with CO2 to form BaCO3 | Dictates dry-atmosphere storage, prompt chamber loading, and surface-preparation practices before deposition |
| Electronic Character | Wide-bandgap insulating oxide | Requires RF or pulsed-DC sputtering rather than conventional DC sputtering |
Types & Grades of Barium Oxide
Barium Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| Standard sputtering grade | 99.9% (3N) | general-purpose grade for exploratory PVD coating and component-oxide research |
| High-purity grade | 99.95% | reduced impurity content for dielectric-film and getter-layer research sensitive to contamination |
| Ultra-high-purity grade | 99.99% (4N) | preferred for complex-oxide thin-film work where barium stoichiometry and trace impurities affect film properties |
| Research grade | 99.999% (5N), available on request | used in fundamental thermionic-emission and superconducting-oxide precursor film studies requiring minimal contamination |
| Bonded target assemblies | custom purity, indium or elastomer bonded | improves thermal contact and handling safety for a reactive, moisture-sensitive ceramic target |
Applications of Barium Oxide
Sputtered films of Barium Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Electronics and dielectrics | Barium titanate family dielectric thin films | Supplies barium as a component oxide for tunable capacitor and dielectric film research |
| Vacuum electron devices | Thermionic cathode coatings | Forms low-work-function barium oxide surface layers that promote electron emission in hot cathodes |
| Vacuum systems and sensors | Getter-forming thin films | Scavenges residual oxygen, moisture, and CO2 within sealed vacuum enclosures to maintain vacuum quality |
| Superconductor and complex-oxide research | Precursor/component layer in barium-bearing cuprate and perovskite oxide films | Delivers controlled barium content during multi-target or reactive codeposition of complex-oxide films |
| Optics and speciality glass research | Experimental barium-oxide-containing optical coatings | contributes to refractive-index tuning studies in oxide glass and coating systems |
| Materials science and academic research | General barium-oxide thin-film and reactivity studies | Provides a controlled, high-purity BaO source for investigating oxide chemistry, hydration, and carbonation behaviour in thin-film form |
Why Partner with Infinita Materials?
- Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
- Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
- Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Barium Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Frequently Asked Questions
What is barium oxide used for?
Barium oxide is primarily used as a sputtering target as thin films with optical, electronic, or catalytic functionalities.
What are the main applications of Barium Oxide thin films?
Ba₂O₃ thin films are used in the semiconductor industry as dielectrics and capacitors, in optical coatings for anti-reflection layers and mirrors, as electron emitters in cathodes, in photocatalytic applications for environmental remediation, in thermal barrier coatings, and in battery technologies.
How is Ba₂O₃ thin film deposition achieved?
Ba₂O₃ nanoparticle thin films are deposited through sputtering, where a Ba₂O₃ nanoparticle target is bombarded by high-energy ions, causing atoms or molecules to be ejected from the target and deposited on a substrate.
Barium Oxide, Ba2O3
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