Vanadium Oxide, V2O5
Vanadium oxide (V2O5), also called vanadium pentoxide, is a layered n-type semiconducting ceramic supplied by Infinita Materials as a high-purity sputtering target for thin-film ion-storage, electrochromic, and gas-sensing applications. Its orthorhombic, sheet-like crystal structure and mixed-valence chemistry give it an unusually reversible capacity to intercalate small ions such as Li+ and H+, a property few binary oxides match. Infinita Materials produces V2O5 targets from tightly stoichiometry-controlled ceramic billets, in standard catalogue sizes as well as bonded and large-format configurations for production coating lines.
| Purity (%) : | >99.9 |
| Dimensions : | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction to Vanadium Oxide
Vanadium Oxide (V₂O₅) has a layered orthorhombic structure (Pmmn) composed of distorted VO₅ units. Its variable oxidation states and oxygen non-stoichiometry (V₂O₅₋ₓ) provide strong redox activity and ion-storage capability. With a bandgap of approximately 2.2–2.4 eV and a melting point near 690°C, V₂O₅ forms stable thin films at relatively moderate processing temperatures. Sputtered V₂O₅/VOₓ films are used in electrochromic coatings, thin-film lithium batteries, sensors, and energy-storage devices. Due to its sensitivity to oxygen loss during sputtering, careful control of target purity, stoichiometry, deposition conditions, and bonding is important for reliable, consistent film performance.
FAQs
Introduction to Vanadium Oxide
Vanadium Oxide (V₂O₅) has a layered orthorhombic structure (Pmmn) composed of distorted VO₅ units. Its variable oxidation states and oxygen non-stoichiometry (V₂O₅₋ₓ) provide strong redox activity and ion-storage capability. With a bandgap of approximately 2.2–2.4 eV and a melting point near 690°C, V₂O₅ forms stable thin films at relatively moderate processing temperatures. Sputtered V₂O₅/VOₓ films are used in electrochromic coatings, thin-film lithium batteries, sensors, and energy-storage devices. Due to its sensitivity to oxygen loss during sputtering, careful control of target purity, stoichiometry, deposition conditions, and bonding is important for reliable, consistent film performance.
Key Properties of Vanadium Oxide
| Property | Value | Significance |
|---|
| Crystal structure | Orthorhombic, layered alpha-V2O5 (space group Pmmn) | Sheet-like VO5 layers create open channels favourable for reversible Li+/H+ ion intercalation in sputtered films |
| Molar mass | ~181.88 g/mol | Used to convert target mass loss to deposited film thickness and to calculate stoichiometric reactive-gas flow rates |
| Density (theoretical) | ~3.36 g/cm3 | Baseline for target mass specification and for judging deposited film density relative to bulk |
| Melting point | ~690 C (963 K) | Sets a comparatively low thermal budget versus refractory oxide targets, easing bonding and reducing thermal-shock risk during long runs |
| Optical band gap | ~2.2 – 2.4 eV, n-type semiconductor | Governs the visible-light absorption edge exploited in electrochromic and photochromic device films |
| Electrical resistivity | Moderate to high; semiconducting, strongly dependent on oxygen stoichiometry | Determines whether RF or reactive DC/pulsed-DC sputtering is the practical deposition route |
| Thermal conductivity | Low, typical of oxide ceramics | Ceramic target is prone to thermal-shock cracking under high power density, favouring bonded assemblies and gradual power ramp-up. |
| Sputtering behavior | Direct RF magnetron from ceramic target, or reactive DC/pulsed-DC from metallic V in O2/Ar | Target tends to lose oxygen preferentially under ion bombardment; O2 partial pressure must be managed to hold stoichiometric VOx film composition. |
Types & Grades of Vanadium Oxide
Vanadium Oxide targets are offered in standard catalog sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| Standard catalogue disc (IN-V-01) | 99.9% | 1in diameter x 0.125in thick; typical for R&D and small-chamber process development |
| Standard catalogue disc (IN-V-02) | 99.9% | 2 in diameter x 0.25 in thick; common size for pilot-line electrochromic and battery-film deposition |
| High-purity research grade | 99.99% (4N5) | Reduced alkali and transition-metal trace content for lithium-battery cathode and low-leakage electrochromic film studies |
| Bonded ceramic assembly | 99.9% or higher | V2O5 ceramic indium- or elastomer-bonded to a copper backing plate to manage thermal shock during extended RF sputtering runs |
| Large-format / custom/rotary | 99.9% – 99.99% | Rectangular planar and rotary cylindrical targets sized for production-scale architectural glass and roll-to-roll coating lines |
Applications of Vanadium Oxide
Sputtered films of Vanadium Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Smart glass/architecture | Electrochromic window and glazing coatings | V2O5 ion-storage or counter-electrode layer reversibly intercalates ions to switch optical transmittance and tint |
| Energy storage | Thin-film lithium microbattery cathodes | Layered V2O5 structure reversibly intercalates Li+ at high density, providing high-capacity solid-state cathode films. |
| Gas sensing | Chemiresistive NH3, H2, and ethanol sensors | Semiconducting V2O5 film resistance shifts measurably on surface gas adsorption, enabling low-power sensor elements. |
| Optics/photonics | Optical switching and photochromic coatings | Band gap and oxidation-state-dependent absorption support tunable optical transmission elements |
| Industrial catalysis | Selective oxidation and SCR catalyst coatings | V2O5 surface redox sites catalyse NOx reduction and hydrocarbon oxidation in coated catalytic films and monoliths |
| Semiconductor / neuromorphic devices | Resistive-switching and memristive memory films | Multivalent vanadium chemistry supports reversible resistance-state switching used in emerging memory device stacks. |
Why Partner with Infinita Materials?
- Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
- Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
- Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Vanadium Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalog target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Frequently Asked Questions
Vanadium Oxide, V2O5
Used in Various Industries
Biomedical
Energy
Aerospace
Automotive
Healthcare
Electronics
