Bismuth Lanthanum Ferrite, Bi(1-x)LaxFeO3

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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    Catalogue CodeIN-BiFeLa-01 IN-BiFeLa-02
    CAS No.12010-42-3
    Chemical FormulaBi(1-x) LaxFeO3
    Compound NameBismuth Lanthanum Ferrite
    Purity (%)>99.9
    DimensionsDia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”

    Introduction

    Bi(₁₋ₓ)LaₓFeO₃ sputter targets are high-purity materials that produce thin films with unique multiferroic properties, combining ferroelectric and magnetic behaviors. By substituting lanthanum (La) for bismuth (Bi), the material’s properties can be tuned to achieve enhanced electrical conductivity and improved ferroelectric performance while retaining its magnetoelectric coupling. These sputter targets are ideal for applications in sensors, non-volatile memory devices, and spintronics, where the coupling of electric and magnetic fields is essential. The high purity of Bi(₁₋ₓ)LaₓFeO₃ sputter targets ensures the deposition of consistent and high-quality films, enabling the development of advanced devices with multifunctional capabilities.

    Properties of Bismuth Lanthanum Ferrite

    The following table presents Bismuth Lanthanum Ferrite Properties.

    PropertiesDetails
    AppearanceSolid/circular, disc, and rectangular
    Magnetic propertyIt exhibits Ferroelectric properties with varying x values.

    Applications

    Applications of Bismuth Lanthanum Ferrite are as follows:

    • Multiferroic Devices: It is used in highly advanced multiferroic applications due to its ferroelectric and magnetic properties. This compound is applied to memory and sensing technologies.
    • Spintronic: Spintronic devices use spin for substantial data storage and processing instead of an electron charge.
    • Photocatalysis: It is used as a photocatalyst in cleaning environments to degrade organic wastes and dyes in wastewater.
    • Energy Harvesting: Its ferroelectric properties are used in energy harvesting devices, where mechanical energy can be converted into electrical energy to power small electronic devices.
    • Ferroelectric Memory Devices: It is used in non-volatile ferroelectric memory devices, especially to take advantage of the high dielectric constant and polarization, which enable good data storage qualities.
    • Magnetic Field Sensors: It is used in magnetic field sensors with enhanced magnetization properties, with lanthanum-doped samples being among the most improved.

    FAQs

    Queston: How is Bi(1-x)LaxFeO₃ typically used in thin-film deposition?

    Answere: Bi(1-x)LaxFeO₃ sputter targets are deposited as thin films on substrates through magnetron sputtering, forming a precursor base for developing various functional devices in electronics and photonics.

    Queston: What is the advantage of using sputter deposition for Bi(1-x)LaxFeO₃ thin films?

    Answere: Sputtering allows for precise film thickness and composition control, ensuring uniform deposition of Bi(1-x)LaxFeO₃ thin films with excellent quality for high-performance device applications.

    Queston: What are the main applications of Bi(1-x)LaxFeO₃ sputter targets?

    Answere: It is primarily used to fabricate thin films for applications in spintronics, sensors, actuators, memory devices, and multiferroic devices.

    1 review for Bismuth Lanthanum Ferrite, Bi(1-x)LaxFeO3

    1. sachin

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