Bi0.9Ca0.1FeO3 (Bismuth Calcium Ferrite) sputtering targets a calcium-substituted derivative of the multiferroic perovskite bismuth ferrite (BiFeO3). The composition is engineered to introduce controlled acceptor doping and oxygen-vacancy chemistry, letting researchers tune the electrical conductivity and defect structure of BiFeO3-based thin films while preserving its characteristic room-temperature ferroelectric and antiferromagnetic order. Targets are produced to documented composition, purity, and density specifications for reproducible thin-film deposition.
Bismuth Calcium Ferrite (Bi₀.₉Ca₀.₁FeO₃) is a Ca-substituted BiFeO₃ multiferroic retaining the distorted rhombohedral R3c perovskite structure, with Ca²⁺ replacing a fraction of Bi³⁺ at the A-site. This acceptor substitution introduces oxygen vacancies and can promote partial Fe³⁺/Fe⁴⁺ compensation, modifying the material’s electrical and ionic conductivity while retaining the characteristic ferroelectric and antiferromagnetic ordering of BiFeO₃. As a sputtering target, dense and homogeneous Bi₀.₉Ca₀.₁FeO₃ provides precise Ca: Bi stoichiometry and controlled defect chemistry during thin-film deposition. RF magnetron sputtering enables uniform films for multiferroic devices, ferroelectric photovoltaic absorbers, resistive-switching memory, and lead-free piezoelectric MEMS applications where reproducible composition and conductivity are critical.
Answer: Bi₀.₉Ca₀.₁FeO₃ is used as a sputtering target because it allows for the deposition of thin films that retain the material's unique multiferroic properties, including high dielectric constants, strong ferroelectricity, and magnetism.
Answer: Bi₀.₉Ca₀.₁FeO₃ is typically deposited using magnetron sputtering or radio-frequency (RF) sputtering, where ions are bombarded onto the target material in a vacuum chamber.
Answer: Due to its piezoelectric properties, it can thus be used for energy harvesting applications, which convert mechanical energy to electrical energy, possibly changing the face of renewable energy solutions.
Bismuth Calcium Ferrite (Bi₀.₉Ca₀.₁FeO₃) is a Ca-substituted BiFeO₃ multiferroic retaining the distorted rhombohedral R3c perovskite structure, with Ca²⁺ replacing a fraction of Bi³⁺ at the A-site. This acceptor substitution introduces oxygen vacancies and can promote partial Fe³⁺/Fe⁴⁺ compensation, modifying the material’s electrical and ionic conductivity while retaining the characteristic ferroelectric and antiferromagnetic ordering of BiFeO₃. As a sputtering target, dense and homogeneous Bi₀.₉Ca₀.₁FeO₃ provides precise Ca: Bi stoichiometry and controlled defect chemistry during thin-film deposition. RF magnetron sputtering enables uniform films for multiferroic devices, ferroelectric photovoltaic absorbers, resistive-switching memory, and lead-free piezoelectric MEMS applications where reproducible composition and conductivity are critical.
Key Properties of Bismuth Calcium Ferrite
Property
Value
Significance
Chemical Formula
Bi0.9Ca0.1FeO3
Ca2+ substitution at the Bi3+ site introduces acceptor doping and compensating oxygen vacancies
Crystal Structure
Distorted rhombohedral perovskite, R3c-derived, isostructural with parent BiFeO3
Supports the coexisting ferroelectric and antiferromagnetic order that defines multiferroic behaviour
Molar Mass
~295.93 g/mol
used for stoichiometric target-mass calculations and deposition-rate planning
Density (theoretical)
~8.0 g/cm3
governs target mass, sputter yield, and achievable film packing density
CAS Number
12010-42-3 (parent BiFeO3 registry number)
required for shipping documentation, safety data sheets, and customs classification
Purity
99.9% standard, up to 99.9995% on request
Controls film stoichiometry, trace-metal defect density, and electrical leakage behaviour
Electrical Conductivity
Moderate to high, increasing with Ca content via oxygen-vacancy and hole doping
relevant to leakage-current control, DC-bias compatibility, and resistive-switching design
Magnetic/Ferroelectric Ordering
Antiferromagnetic (Neel) and ferroelectric (Curie) transitions both well above room temperature, near parent BiFeO3 values though shifted by doping
defines the usable temperature window for multiferroic device operation
Types & Grades of Bismuth Calcium Ferrite
Bismuth Calcium Ferrite targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
Grade / Form
Typical Purity
Key Features / Uses
Standard Research Grade
99.9%
Polished disc targets for lab-scale RF magnetron or pulsed-laser deposition and general multiferroic thin-film screening
High-Purity Grade
99.95% – 99.99%
Reduced trace-metal contamination for reproducible ferroelectric and magnetic characterisation studies
Ultra-High-Purity Grade
99.995% – 99.9995%
leakage-current-sensitive photovoltaic and memory device research requiring minimal parasitic defect states
Hot-Pressed / Bonded Target
99.9%, indium- or elastomer-bonded to copper backing plate
Improved thermal conductivity and mechanical stability for extended high-power sputtering runs
Custom-Doped Composition
Variable Ca content (x = 0.05 – 0.20), 99.9%+
Tailored oxygen-vacancy concentration and conductivity for composition-dependent device studies
Applications of Bismuth Calcium Ferrite
Sputtered films of Bismuth Calcium Ferrite support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
Industry
Application
Function
Multiferroic materials research
Epitaxial Ca-doped BiFeO3 films on SrTiO3 or STO-buffered substrates
Studying magnetoelectric coupling and strain-tuned ferroelectric polarisation
Leveraging BiFeO3’s bulk photovoltaic effect with a carrier concentration tunable via Ca doping
Resistive-switching memory (RRAM)
Oxygen-vacancy-mediated memristive thin films
Ca doping increases the mobile oxygen-vacancy population that underlies resistive switching
MEMS and piezoelectric actuators
Lead-free piezoelectric thin-film coatings
Provides an environmentally compliant alternative to PZT in thin-film actuator stacks
Spintronics
Magnetoelectric heterostructures and multiferroic tunnel junctions
room-temperature coexistence of ferroelectric and antiferromagnetic order enables electric-field control of magnetism
Academic and national-lab materials science
Combinatorial doping studies across the BiFeO3 composition series
Systematic investigation of acceptor-doping effects on defect chemistry and functional properties
Why Partner with Infinita Materials?
Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Bismuth Calcium Ferrite sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Other Related Product to Bismuth Calcium Ferrite, Bi0.9Ca0.1FeO3
Bi₀.₉Ca₀.₁FeO₃ is used as a sputtering target because it allows for the deposition of thin films that retain the material's unique multiferroic properties, including high dielectric constants, strong ferroelectricity, and magnetism.
Bi₀.₉Ca₀.₁FeO₃ is typically deposited using magnetron sputtering or radio-frequency (RF) sputtering, where ions are bombarded onto the target material in a vacuum chamber.
Due to its piezoelectric properties, it can thus be used for energy harvesting applications, which convert mechanical energy to electrical energy, possibly changing the face of renewable energy solutions.
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