Barium Cerium Yttrium Zirconate

Barium Cerium Yttrium Zirconate sputtering targets, supplied by Infinita Materials, are precision-fabricated ceramic sources of a yttrium-doped barium cerate-zirconate perovskite, the leading materials family for proton-conducting electrolytes in protonic ceramic fuel cells and electrolysers. Formulated to combine the high protonic conductivity of barium cerate with the chemical and mechanical robustness of barium zirconate, these targets enable reproducible thin-film deposition of dense, phase-pure BCZY layers by RF and DC magnetron sputtering. Each target is manufactured to controlled stoichiometry and density for stable, drift-free deposition across production runs.

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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Introduction to Barium Cerium Yttrium Zirconate

Barium Cerium Yttrium Zirconate (BCZY/BZCY) is a proton-conducting perovskite oxide with the general composition BaCe₁₋ₓ₋ᵧZrᵧYₓO₃₋δ, where Y³⁺ substitution for Ce⁴⁺/Zr⁴⁺ creates oxygen vacancies that incorporate protons under humid conditions. Cerium enhances proton and oxide-ion conductivity, while zirconium improves chemical stability, sinterability, and resistance to CO₂ and H₂O degradation. As a sputtering target, dense stoichiometric BCZY enables precise composition and thickness control for thin, gas-tight electrolyte layers with low ohmic resistance. RF or pulsed-DC magnetron sputtering is used to deposit BCZY films for intermediate-temperature protonic ceramic fuel cells and electrolysers, hydrogen and humidity sensors, and research into proton-conducting perovskite defect chemistry.

FAQs

Question: What are the key benefits of using BaCe₁₋ₓ₋ᵧYrxZry as a sputtering target?

Answer: The main benefits of BaCe₁₋ₓ₋ᵧYrxZry as a sputtering target include its ability to produce films with excellent ionic conductivity, high-temperature stability, and good chemical resistance.

Question: What types of films are produced using BaCe₁₋ₓ₋ᵧYrxZry sputtering targets?

Answer: BaCe₁₋ₓ₋ᵧYrxZry sputtering targets create thin films that exhibit high ionic conductivity, chemical stability, and electrochemical properties.

Question: Can BaCe₁₋ₓ₋ᵧYrxZry sputtering targets be used in reactive sputtering processes?

Answer: Yes, BaCe₁₋ₓ₋ᵧYrxZry sputtering targets can be used in reactive sputtering processes.

Question: What sputtering conditions are recommended for this target?

Answer: Both RF and DC magnetron sputtering are used, typically with elastomer or indium bonding to the backing plate; process parameters such as oxygen partial pressure and substrate temperature should be optimized to obtain phase-pure, dense perovskite films and are best established for the specific deposition system in use.