Cobalt Oxide, CoO
Cobalt oxide (CoO) is a rock-salt-structured transition-metal oxide valued for its electronic, magnetic, and catalytic behaviour in thin-film form. Infinita Materials supplies CoO sputtering targets as hot-pressed and sintered ceramic discs and plates across standard and custom geometries, engineered for stable, low-particulate thin-film deposition. These targets serve battery electrode research, electrochromic coating development, gas-sensor fabrication, and catalysis studies requiring reproducible cobalt-oxide films. All targets are supplied by Infinita Materials with full traceability to purity and process documentation.
| Purity (%) : | >99.9 |
| Dimensions : | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction to Cobalt Oxide
Cobalt Oxide (CoO) is a cobalt(II) oxide ceramic that crystallises in the cubic rock-salt (periclase) structure, with Co²⁺ ions occupying octahedral sites. It exhibits antiferromagnetic ordering below approximately 291 K and p-type semiconducting behaviour associated with cobalt vacancies and mixed-valence defects. CoO is distinct from Co₃O₄, which has a different spinel structure and oxidation state distribution. With a melting point near 1,933 °C, CoO is thermally robust and refractory. As a sputtering target, dense ceramic CoO provides reproducible cobalt-to-oxygen stoichiometry and minimises the process hysteresis associated with reactive cobalt sputtering. RF magnetron sputtering enables films for lithium-ion battery electrodes, electrochromic coatings, oxygen electrocatalysis, gas sensors, and functional oxide research.
FAQs
Introduction to Cobalt Oxide
Cobalt Oxide (CoO) is a cobalt(II) oxide ceramic that crystallises in the cubic rock-salt (periclase) structure, with Co²⁺ ions occupying octahedral sites. It exhibits antiferromagnetic ordering below approximately 291 K and p-type semiconducting behaviour associated with cobalt vacancies and mixed-valence defects. CoO is distinct from Co₃O₄, which has a different spinel structure and oxidation state distribution. With a melting point near 1,933 °C, CoO is thermally robust and refractory. As a sputtering target, dense ceramic CoO provides reproducible cobalt-to-oxygen stoichiometry and minimises the process hysteresis associated with reactive cobalt sputtering. RF magnetron sputtering enables films for lithium-ion battery electrodes, electrochromic coatings, oxygen electrocatalysis, gas sensors, and functional oxide research.
Key Properties of Cobalt Oxide
| Property | Value | Significance |
|---|
| Chemical formula | CoO | Confirms 1:1 cobalt-to-oxygen stoichiometry used for deposition-rate and mass-balance calculations |
| CAS number | 1307-96-6 | Unique registry identifier for procurement, safety documentation, and regulatory compliance |
| Molar mass | ~74.93 g/mol | Basis for stoichiometric verification and sputter-rate to mass-loss conversions |
| Density (bulk ceramic) | ~6.1 g/cm3 | Determines target mass per unit volume and informs erosion-life and cooling calculations |
| Crystal structure | Cubic rock-salt (periclase) | Simple, well-characterised lattice supports consistent sputter yield and film nucleation behaviour |
| Melting point | ~1933 C | Reflects the Co-O bond strength and target stability under sustained plasma heating |
| Magnetic ordering | Antiferromagnetic below ~291 K (Neel temperature) | Underlies interest in CoO thin films for spintronic exchange-bias and magnetic multilayer research |
| Electrical character | p-type semiconductor (defect-mediated) | Cobalt-vacancy-driven conductivity supports use in gas-sensing and catalytic electrode films. |
Types & Grades of Cobalt Oxide
Cobalt Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| 2N5-3N hot-pressed disc | 99.5% – 99.9% | Cost-effective grade for coating trials, general catalysis studies, and early-stage process development |
| 3N5 sintered ceramic target | 99.95% | Common industrial grade balancing cost and film purity for sensor and electrode coating lines |
| 4N high-purity target | 99.99% | Standard grade for battery-electrode research and electrochromic film deposition requiring low contamination |
| 5N ultra-high-purity target | 99.999% | Lowest metallic and particulate contamination for magnetic thin-film and spintronic research |
| Bonded/segmented planar target | 99.9% – 99.99% | Indium- or elastomer-bonded mounting recommended for this brittle, low-thermal-conductivity ceramic on large-area magnetron systems |
Applications of Sputtered Cobalt Oxide
Sputtered films of Cobalt Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Energy storage | Model conversion-type electrode films for Li-ion battery research | Cobalt-oxide thin films provide a well-characterised platform for studying lithiation, capacity, and cycling behaviour |
| Smart glass and displays | Electrochromic window and mirror coatings | Reversible valence and optical-absorption switching under applied voltage enables tunable light transmission. |
| Gas sensing | Chemiresistive thin-film gas sensors | Resistance shifts on exposure to reducing or oxidising gases enable sensitive, low-power detection layers. |
| Electrocatalysis | Oxygen evolution and oxygen reduction reaction catalyst films | Cobalt-oxide surfaces provide active sites for water-splitting and fuel-cell electrocatalysis studies |
| Magnetics and spintronics | Antiferromagnetic exchange-bias layers in spin-valve structures | CoO’s antiferromagnetic ordering below its Neel temperature pins adjacent ferromagnetic layers in multilayer stacks |
| Catalysis and coatings research | Model oxide surfaces for heterogeneous catalysis studies | Well-defined stoichiometry and crystal structure make sputtered CoO films a reproducible research substrate |
Why Partner with Infinita Materials?
- Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
- Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
- Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Cobalt Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Frequently Asked Questions
Cobalt Oxide, CoO
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