Strontium niobium titanate, commercially known as niobium-doped strontium titanate (Nb: SrTiO3), is a cubic perovskite oxide engineered for electrical conductivity within an otherwise insulating host lattice. Substituting a small fraction of titanium sites with niobium (typically 0.05-1 wt% Nb) donates free electrons to the SrTiO3 structure, yielding a ceramic that is simultaneously optically transparent and electrically conductive. Infinita Materials supplies this compound as a high-density, sintered sputtering target for depositing conductive oxide thin films in research and production PVD systems. It is a preferred source material wherever a lattice-matched, conductive perovskite film is needed alongside other complex oxide layers.
Nb-doped SrTiO₃ (Nb₃) retains the cubic perovskite structure (Pm-3m) of undoped SrTiO₃, with a lattice constant near 3.905 Å. Substituting Nb⁵⁺ for Ti⁴⁺ introduces conduction electrons, converting the insulating ceramic into a degenerate n-type semiconductor while largely preserving its thermal stability and optical properties. This combination of conductivity and perovskite compatibility makes Nb₃ valuable for sputtered thin films. Its close lattice matching with numerous functional oxides enables use as a conductive electrode and buffer layer in epitaxial heterostructures. Sputtered Nb₃ films are also investigated for transparent conducting oxides, memristive devices, photoelectrochemical systems, and complex-oxide electronic applications requiring conductive perovskite layers.
Answer: SrNb(₁₋ₓ)TiO₃ sputtering targets deposit thin films with customized electrical, optical, and catalytic properties tailored to specific technological applications.
Answer: The ratio of niobium to titanium influences the material's conductivity, dielectric constant, and catalytic activity, allowing for application-specific customization.
Nb-doped SrTiO₃ (Nb₃) retains the cubic perovskite structure (Pm-3m) of undoped SrTiO₃, with a lattice constant near 3.905 Å. Substituting Nb⁵⁺ for Ti⁴⁺ introduces conduction electrons, converting the insulating ceramic into a degenerate n-type semiconductor while largely preserving its thermal stability and optical properties. This combination of conductivity and perovskite compatibility makes Nb₃ valuable for sputtered thin films. Its close lattice matching with numerous functional oxides enables use as a conductive electrode and buffer layer in epitaxial heterostructures. Sputtered Nb₃ films are also investigated for transparent conducting oxides, memristive devices, photoelectrochemical systems, and complex-oxide electronic applications requiring conductive perovskite layers.
Key Properties of Strontium Niobium Titanate
Property
Value
Significance
Crystal structure
Cubic perovskite, space group Pm-3m
Enables close lattice matching to other perovskite oxide films grown in the same heterostructure
Lattice constant
a ~ 3.905 Angstroms
Sets epitaxial compatibility with substrates and overlayers such as LaAlO3, LSMO, and BaTiO3-family films
Electrical resistivity
~0.01-0.1 ohm-cm, decreasing with higher Nb wt%
Sufficient carrier density permits DC or pulsed-DC magnetron sputtering rather than requiring RF
Density (sintered target)
~5.12-5.18 g/cm3
Governs target mass, deposition rate, and expected target lifetime for a given thickness
Melting point
~2080 C
Confirms high thermal stability typical of refractory perovskite oxide ceramics
Lower conductivity in the porous sintered form means target cooling and power ramp rates must be controlled to avoid thermal cracking
Dielectric constant
~300 at room temperature for undoped SrTiO3; falls as Nb doping raises free-carrier density
Relevant when the same base composition is also used for dielectric buffer or gate-oxide layers
Optical bandgap
~3.2 eV (undoped); doped films remain visibly transparent while conductive
Basis for use as a transparent conducting oxide film alternative to ITO/FTO
Types & Grades of Strontium Niobium Titanate
Strontium Niobium Titanate targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
Grade / Form
Typical Purity
Key Features / Uses
Standard catalogue disc, IN-NbSrTi-01
>99.9%
1in diameter x 0.125in thick; stock size for lab-scale and R&D PVD chambers
Standard catalogue disc, IN-NbSrTi-02
>99.9%
2 in diameter x 0.25 in thick; higher material volume for longer or repeated deposition runs
High-purity grade
99.99% (4N), 99.999% (5N) on request
Reduced trace-metal content for demanding oxide-electronics and semiconductor-grade film work
Large-format / custom planar
>99.9%, up to 4N on request
Oversized round or rectangular targets sized for pilot-line and production in-line sputter coaters
Bonded and rotary assemblies
>99.9%
Target bonded to copper or aluminium backing plates, or fabricated as rotary tube segments, for industrial magnetron systems and extended production uptime.
Applications of Strontium Niobium Titanate
Sputtered films of Strontium Niobium Titanate support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
Industry
Application
Function
Oxide electronics
Resistive switching (RRAM) and memristive device stacks
Conductive perovskite electrode and active oxide layer within complex-oxide device architectures
Photocatalysis and photoelectrochemistry
Photoelectrode and charge-transport thin films
Conductive, chemically stable oxide layer supporting water-splitting and photoelectrochemical research
Transparent conducting oxides
Alternative TCO films to ITO and FTO
Combines visible-range optical transparency with metallic-level electrical conductivity
Complex-oxide heterostructures
Epitaxial buffer and bottom-electrode layers
Lattice-matched conductive template beneath ferroelectric, magnetoresistive, or superconducting oxide films
Thermoelectric materials research
n-type oxide thermoelectric thin films
Nb-doped SrTiO3 films are studied for Seebeck coefficient and power-factor optimisation in oxide thermoelectrics.
Solid oxide fuel cells and high-temperature electrochemistry
Conductive interconnect and electrode layers
Chemically and thermally stable conductive oxide suited to demanding high-temperature electrochemical environments
Why Partner with Infinita Materials?
Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Strontium Niobium Titanate sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Other Related Product to Strontium Niobium Titanate, SrNb(1-x)TixO3
SrNb(₁₋ₓ)TiO₃ sputtering targets deposit thin films with customized electrical, optical, and catalytic properties tailored to specific technological applications.
The ratio of niobium to titanium influences the material's conductivity, dielectric constant, and catalytic activity, allowing for application-specific customization.
Its photocatalytic activity can be enhanced by optimizing its composition, making water splitting and CO₂ reduction practical.
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