Lithium Nickel Cobalt Oxide, LiNi(1-x)CoxO2

Lithium Nickel Cobalt Oxide (LiNi(1-x)CoxO2) is a layered transition-metal oxide supplied by Infinita Materials as a high-density sputtering target for thin-film lithium-ion battery cathode research and microelectronics energy storage. As a binary solid solution between LiNiO2 and LiCoO2, it offers researchers a tunable platform for studying how the nickel-to-cobalt ratio governs capacity, voltage, and structural stability in layered cathode films. Targets are produced as sintered ceramic discs engineered for stable, particulate-free RF and pulsed-DC sputtering.

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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Introduction to Lithium Nickel Cobalt Oxide

Lithium Nickel Cobalt Oxide LiNi₁₋ₓCoₓO₂ crystallises in the layered α-NaFeO₂-type structure (R-3m), with Li and Ni/Co occupying alternating octahedral layers that enable reversible lithium-ion intercalation. Cobalt substitution reduces Li/Ni cation mixing, improving structural stability and cycling reversibility while retaining the high capacity associated with nickel-rich compositions. Sputtering from ceramic targets enables dense, uniform films with controlled composition and thickness, making the material suitable for thin-film energy-storage architectures. Sputtered LiNi₁₋ₓCoₓO₂ films are investigated as cathode layers in solid-state and microbattery systems, including on-chip energy storage for MEMS, RFID, wearable, and implantable electronics, where precise thickness and direct substrate integration are essential.

FAQs

Question: What is Lithium Nickel Cobalt Oxide (LiNi₁₋ₓCoxO₂) used in sputtering?

Answer: LiNi₁₋ₓCoxO₂ is commonly used as a target material in thin-film deposition processes, particularly for producing cathodes in lithium-ion batteries. It offers excellent electrochemical performance.

Question: What are the advantages of using LiNi₁₋ₓCoxO₂ as a sputtering target?

Answer: It provides high capacity and stability in lithium-ion batteries, enabling the production of high-performance thin films with good cycling efficiency and thermal stability.

Question: What is the sputtering process for LiNi₁₋ₓCoxO₂?

Answer: During sputtering, argon ions bombard the target, causing the material to eject as a thin film onto a substrate. The substrate is then used in battery and electronic applications.

Question: What are the challenges experienced when using LiNi₁₋ₓCoxO₂ for sputtering?

Answer: Some challenges include target oxidation, precise composition control, and potential sputtering instability due to the material's complexity in stoichiometric ratios during deposition.