Chrome Oxide, Cr2O3

Chrome oxide (Cr2O3) sputtering targets at purities from 99.9% to 99.99%, engineered for thin-film deposition processes that demand hardness, chemical inertness, and long-term stability. As chromium(III) oxide, Cr2O3 combines a corundum-type crystal structure with exceptional wear and corrosion resistance, making it a preferred oxide ceramic for protective, decorative, and functional coatings. Each target is produced to controlled density and grain size for consistent magnetron sputtering performance.

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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Introduction to Chrome Oxide

Chromium Oxide (Cr₂O₃) is a highly stable ceramic that crystallises in the rhombohedral corundum structure (R-3c), similar to α-Al₂O₃ and α-Fe₂O₃. Its dense crystal structure provides high hardness, a melting point near 2,435 °C, and excellent resistance to chemical attack, wear, and corrosion. Cr₂O₃ is also an antiferromagnetic Mott insulator with a Néel temperature of approximately 307 K, enabling its use in magnetic and spintronic research. As a sputtering target, dense high-purity Cr₂O₃ enables uniform, reproducible RF magnetron deposition of durable oxide films. Applications include hard protective coatings, decorative and anti-reflective coatings, wear-resistant surfaces, resistive thin-film elements, and exchange-bias or pinning layers for spintronic and magnetic-storage devices.

FAQs

Question: What is a Chrome Oxide (Cr₂O₃) sputter target?

Answer: A Cr₂O₃ sputter target is a solid piece of chromium oxide material used in sputtering processes to deposit thin films of chromium oxide (Cr₂O₃) onto substrates, such as metal, glass, or ceramics.

Question: Can Cr₂O₃ sputter targets be recycled?

Answer: Indeed, Cr₂O₃ sputter targets can be recycled, especially in most industries. However, further processing must guarantee that chromium oxide remainders are treated according to environmental and safety provisions.

Question: What industries use Cr₂O₃ sputter targets?

Answer: Cr₂O₃ sputter targets are also applied in electronics and optics, aerospace, automotive manufacturing, chemical processing, glass and ceramics, and research and development of new materials.

Question: Is Cr2O3 sputtering typically done with RF or DC power?

Answer: Because Cr2O3 is an electrical insulator, RF magnetron sputtering (or reactive sputtering from a chromium metal target) is standard practice, since a purely dielectric target cannot sustain a stable DC plasma without charge build-up.