Calcium Titanate, CaTiO3
Calcium titanate (CaTiO3) sputtering targets engineered for dielectric, buffer-layer, and biocompatible thin-film applications. As the archetype perovskite oxide, CaTiO3 targets provide a stable, high-purity source material for RF magnetron sputtering across electronics, oxide-epitaxy, and biomedical coating processes. Each target is produced to controlled purity and dimensional tolerances to support consistent film stoichiometry and adhesion.
| Purity (%) : | >99.9 |
| Dimensions : | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction to Calcium Titanate
Calcium Titanate (CaTiO₃) is an orthorhombic perovskite oxide (Pbnm) in which Ca²⁺ occupies the A-site and Ti⁴⁺ is coordinated by corner-sharing TiO₆ octahedra. It is a chemically and thermally stable electrical insulator with a wide bandgap of approximately 3.5 eV, a theoretical density near 4.10 g/cm³, and a melting point around 1,975 °C. Because CaTiO₃ is insulating, RF magnetron sputtering is typically used to deposit dense, stoichiometric thin films with controlled thickness and composition. Sputtered CaTiO₃ is valuable for high-k dielectric and capacitor layers, thin-film transistor structures, perovskite buffer and template layers, biocompatible coatings for titanium implants, and rare-earth-doped luminescent films.
FAQs
Question: What are the advantages of using CaTiO₃ in sputtering?
Answer: CaTiO₃ has a substantial dielectric constant, low electrical loss, and piezoelectric properties that make this compound suitable for energy storage in capacitors, memory devices, and sensor applications. Sputtering enables the deposition of thin films with controllable and tailored properties.
Introduction to Calcium Titanate
Calcium Titanate (CaTiO₃) is an orthorhombic perovskite oxide (Pbnm) in which Ca²⁺ occupies the A-site and Ti⁴⁺ is coordinated by corner-sharing TiO₆ octahedra. It is a chemically and thermally stable electrical insulator with a wide bandgap of approximately 3.5 eV, a theoretical density near 4.10 g/cm³, and a melting point around 1,975 °C. Because CaTiO₃ is insulating, RF magnetron sputtering is typically used to deposit dense, stoichiometric thin films with controlled thickness and composition. Sputtered CaTiO₃ is valuable for high-k dielectric and capacitor layers, thin-film transistor structures, perovskite buffer and template layers, biocompatible coatings for titanium implants, and rare-earth-doped luminescent films.
Key Properties of Calcium Titanate
| Property | Value | Significance |
|---|
| Crystal Structure | Orthorhombic perovskite, space group Pbnm | defines the archetype ABO3 perovskite lattice used as a structural reference for other oxide films |
| Molar Mass | ~135.94 g/mol | used to calculate deposition rate, film stoichiometry, and target consumption |
| Theoretical Density | ~4.10 g/cm3 | benchmark for estimating target-to-film mass transfer and coating thickness |
| Melting Point | 1,975 C (3,587 F) | indicates high thermal stability suited to sustained RF sputtering power densities |
| Bandgap | ~3.5 eV (wide bandgap) | supports use as an insulating, wide-bandgap dielectric layer |
| Dielectric Constant | ~150 – 170 (bulk ceramic) | underlies use as a high-k dielectric in capacitor and MIM film structures |
| CAS Number | 12049-50-2 | unique identifier for regulatory documentation and procurement |
| Sputtering Mode | RF (radio frequency) recommended | required because CaTiO3 is electrically insulating; DC sputtering is not viable |
Types & Grades of Calcium Titanate
Calcium Titanate targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| Standard-purity disc | 99.9% | Cost-effective grade for general dielectric and buffer-layer film deposition |
| High-purity disc | 99.95% | reduced trace-metal contamination for semiconductor and MLCC research |
| Ultra-high-purity disc | 99.99% | optimised for optical and photonic thin films requiring minimal defect density |
| Custom rectangular/planar target | 99.9% – 99.99% | sized to match planar magnetron systems for pilot-line and production coating |
| Bonded target (Cu/Mo backing plate) | 99.9% – 99.99% | improves thermal conductivity and crack resistance during extended RF sputtering runs |
Applications of Calcium Titanate
Sputtered films of Calcium Titanate support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Electronics / Capacitors | Multilayer ceramic and thin-film capacitor dielectrics | Provides a stable, high-permittivity dielectric layer for charge storage |
| Semiconductor / Oxide Electronics | Buffer or template layer for epitaxial growth of other perovskite oxide films | Supplies a lattice-matched template that supports oriented crystal growth |
| Biomedical / Implant Coatings | Biocompatible coatings on titanium implants and orthopaedic or dental devices | improves osseointegration and corrosion resistance of metallic implant surfaces |
| Optoelectronics / Phosphors | Host lattice for rare-earth-doped luminescent thin films | provides a stable perovskite host for up-conversion and down-conversion luminescence |
| Sensors | Gas and humidity sensor thin films | Offers a chemically stable oxide surface with tunable electrical response |
| Research / Academia | Model perovskite system for oxide thin-film physics | Serves as a reference ABO3 perovskite for structural, dielectric, and photocatalytic studies |
Why Partner with Infinita Materials?
- Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
- Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
- Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Calcium Titanate sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Frequently Asked Questions
What are the advantages of using CaTiO₃ in sputtering?
CaTiO₃ has a substantial dielectric constant, low electrical loss, and piezoelectric properties that make this compound suitable for energy storage in capacitors, memory devices, and sensor applications. Sputtering enables the deposition of thin films with controllable and tailored properties.
Calcium Titanate, CaTiO3
Used in Various Industries
Biomedical
Energy
Aerospace
Automotive
Healthcare
Electronics
