Lead Zirconate Titanate with Niobium, PbZr0.52Ti0.48O3 with 1 at% Nb

Niobium-doped lead zirconate titanate (PNZT, or soft PZT) sputtering targets are formulated at the industry-standard morphotropic phase boundary composition PbZr0.52Ti0.48O3 with approximately 1 atomic per cent niobium donor doping. The added niobium produces a softer ferroelectric response than undoped PZT, with higher permittivity, lower coercive field, and improved resistance to ageing, making the material a preferred choice for high-performance piezoelectric MEMS films. Each target is supplied in standard 1 in and 2 in diameter discs, with composition, density, and dopant level controlled across every production lot for reproducible RF magnetron sputtering.

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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Introduction to Lead Zirconate Titanate with Niobium

PNZT is a niobium-doped PZT ceramic retaining the perovskite ABO₃ structure, with Pb²⁺ on the A-site and Zr⁴⁺/Ti⁴⁺ on the B-site near the 52/48 Zr morphotropic phase boundary. Approximately 1 at% Nb⁵⁺ donor doping creates lead vacancies, reducing defect-related domain-wall pinning and producing a softer piezoelectric response with higher dielectric permittivity and piezoelectric coefficients. Sputtering from dense PNZT ceramic targets enables controlled Zr: Ti composition and uniform thin-film deposition on silicon, platinum-coated silicon, and other substrates. PNZT films are widely investigated for piezoelectric MEMS actuators, cantilevers, micromachined ultrasonic transducers, and other devices requiring large displacement, low-voltage operation, and stable cyclic performance.

FAQs

Question: What is the use of PZTN in sputtering?

Answer: PZTN is commonly used to create thin films for piezoelectric, ferroelectric, and dielectric applications in sensors, actuators, and memory devices.

Question: What is the significance of niobium doping in PZT?

Answer: Niobium doping enhances electrical conductivity and modifies the ferroelectric and piezoelectric properties, improving the performance of thin films for specific applications.

Question: What deposition techniques are compatible with PZTN sputtering targets?

Answer: PZTN targets are primarily used in RF or DC magnetron sputtering systems for thin-film deposition on substrates like silicon, glass, or ceramics.

Question: How should PZTN sputtering targets be stored and handled?

Answer: Store in a dry, controlled environment to prevent contamination or degradation. Handle with clean gloves to avoid introducing impurities.

Question: What factors affect the quality of thin films from PZTN targets?

Answer: Factors include sputtering parameters (power, pressure, temperature), substrate preparation, and post-deposition annealing processes.