Introduction to Titanium Dioxide
TiO₂ exists mainly as rutile, anatase, and brookite, with rutile being the thermodynamically stable phase and anatase generally showing higher photocatalytic activity. Phase strongly influences thin-film refractive index, band gap, and surface reactivity. TiO₂ is a wide-bandgap semiconductor with high resistivity, chemical inertness, thermal stability, and a high refractive index. Ceramic TiO₂ targets are typically deposited using RF magnetron sputtering, while metallic titanium targets can be reactively sputtered with oxygen using DC or pulsed-DC methods. Sputtered TiO₂ films are widely used in optical coatings, self-cleaning glass, photocatalytic and antimicrobial surfaces, dielectric layers, and biocompatible coatings for medical implants.
Types & Grades of Titanium Dioxide
Titanium Dioxide targets are offered in standard catalog sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| Standard catalogue target (1 in- 2 in dia.) | >99.9% (3N) | Off-the-shelf hot-pressed ceramic discs sized for common lab and pilot magnetron platforms; IN-Ti-01 / IN-Ti-02 catalogue codes |
| High-purity optical/electronic grade | 99.99% (4N) – 99.999% (5N) | Reduced trace-metal content for anti-reflective optics, waveguides, and dielectric research where impurities affect absorption or leakage current |
| Large-format / custom planar target | >99.9%, custom purity on request | Rectangular and oversized planar geometries machined to customer chamber and cathode dimensions for pilot and production coaters |
| Rotary/cylindrical target | >99.9% – 99.99% | Higher material utilisation and thermal handling for high-throughput in-line reactive sputtering, e.g. architectural and large-area glass coating |
| Bonded target assembly | >99.9% – 99.99% | TiO2 tile indium- or elastomer-bonded to a copper backing plate to improve heat dissipation from this comparatively low-thermal-conductivity ceramic during high-power operation |
Applications of Titanium Dioxide
Sputtered films of Titanium Dioxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Optics and photonics | Anti-reflective and high-index optical coatings | High refractive index layer alternated with a low-index oxide (e.g. SiO2) to reduce surface reflection and tune interference stacks |
| Architectural and solar-control glass | Self-cleaning, low-E, and anti-fog window coatings | Photocatalytic, hydrophilic TiO2 outer layer that breaks down organic residue and sheets water under UV exposure |
| Semiconductor and microelectronics | High-k dielectric and passivation layers | Wide bandgap and high dielectric constant support gate stack and capacitor dielectric research |
| Photovoltaics | Anti-reflective coatings and electron transport/blocking layers | High-index film reduces front-surface reflection and can serve as a compact or blocking layer in cell architectures |
| Photocatalysis and self-cleaning surfaces | UV-activated photocatalytic and antimicrobial coatings | Anatase-phase films generate reactive oxygen species under UV that degrade organic contaminants and inhibit microbial growth |
| Biomedical and implant coatings | Biocompatible, corrosion-resistant surface films on titanium implants | Dense TiO2 passivation layer improves corrosion resistance and supports osseointegration at the implant surface |
Take the Next Step
Infinita Materials fabricates Titanium Dioxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
