Titanium silicate sputtering targets, supplied by Infinita Materials as Ti0.44Si0.10O, are a mixed titanium-silicon oxide ceramic engineered for thin-film deposition where the optical and thermal behaviour of titania must be moderated by silica. The material sits in the same functional class as other mixed-metal-oxide targets used for index-tunable dielectric coatings, combining the high refractive index of TiO2 with the stability and low thermal expansion of SiO2. It is offered in standard catalogue discs and custom geometries for magnetron sputtering systems. Infinita Materials manufactures and ships this target to optics, semiconductor, and display fabricators worldwide.
Titanium Silicate (Ti-Si-O) used for sputtering is typically a substoichiometric solid solution of titanium and silicon oxides rather than pure TiSiO₄. Silicon incorporation disrupts the TiO₂ lattice, improving thermal stability and suppressing the anatase-to-rutile transformation. The resulting amorphous or nanocrystalline ceramic offers tunable optical properties, including refractive index and wide-bandgap behaviour, depending on the Ti: Si ratio. Sputtering from a homogeneous target provides a consistent composition and uniform film properties across large substrates. These films are used in antireflective and optical coatings, semiconductor dielectrics, display components, passivation layers, and protective glazing, where thermal stability, durability, and controlled refractive index are required.
Answer: Titanium silicate (Ti₀.₄₄Si₀.₁₀O) is a composite material consisting of titanium and silicon, known for its unique properties and applications in catalysis and environmental remediation.
Answer: Titanium silicate films combine the high refractive index of titanium oxide (TiO₂) with the transparency and stability of silicon oxide (SiO₂).
Answer: Due to their excellent stability, electrical properties, and optical characteristics, titanium silicate films are suitable for solar cells, including dye-sensitized solar cells (DSSCs) and thin-film solar cells.
Answer: Titanium silicate films have the potential for photocatalytic applications in environmental remediation, such as water purification and air cleaning.
Titanium Silicate (Ti-Si-O) used for sputtering is typically a substoichiometric solid solution of titanium and silicon oxides rather than pure TiSiO₄. Silicon incorporation disrupts the TiO₂ lattice, improving thermal stability and suppressing the anatase-to-rutile transformation. The resulting amorphous or nanocrystalline ceramic offers tunable optical properties, including refractive index and wide-bandgap behaviour, depending on the Ti: Si ratio. Sputtering from a homogeneous target provides a consistent composition and uniform film properties across large substrates. These films are used in antireflective and optical coatings, semiconductor dielectrics, display components, passivation layers, and protective glazing, where thermal stability, durability, and controlled refractive index are required.
Key Properties of Titanium Silicate
Property
Value
Significance
Chemical composition
Ti0.44Si0.10O (mixed Ti-Si oxide, approximately 80-90 at% Ti, 10-20 at% Si in the metal fraction)
Defines the achievable refractive index window and dielectric behaviour of the sputtered film
Crystal structure
Amorphous to nanocrystalline; Si incorporation suppresses long-range TiO2 crystallisation
Yields optically smooth, low-scatter films without post-deposition annealing
Optical bandgap
~3.2 – 3.6 eV
Wide-bandgap oxide, transparent across the visible spectrum for optical coating use
Refractive index
~2.0 – 2.3 at 550 nm, tunable with Si content
Enables index-matched antireflective and high-index stack designs
Favours RF or pulsed-DC magnetron sputtering over conventional DC
Phase stability
Anatase-to-rutile transformation suppressed relative to pure TiO2
Maintains consistent optical properties through thermal processing
Chemical stability
Resistant to many acids and bases
Durable target handling and long service life as a deposited protective coating
Thermal expansion/stability
Lower CTE than pure TiO2, stable at high process temperatures
Reduces coating stress and cracking on glass and semiconductor substrates
Types & Grades of Titanium Silicate
Titanium Silicate targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
Grade / Form
Typical Purity
Key Features / Uses
Standard catalogue disc (IN-SiTi-01)
> 99.9%
1in diameter x 0.125in thick; stocked size for R&D and small-batch coating runs
Standard catalogue disc (IN-SiTi-02)
> 99.9%
2in diameter x 0.25in thick; higher-throughput production runs
High-purity grade
99.99% – 99.999%
Reduced trace-metal content for semiconductor-grade dielectric and optical films
Large-format / custom discs and plates
99.9% and higher
Diameters to 6 in and above, rectangular plates, and adjustable Ti: Si ratios for custom index targets
Bonded and rotary assemblies
99.9% and higher
Indium or elastomer bonding to copper backing plates, plus rotary cylindrical targets for in-line and roll-to-roll coaters
Applications of Titanium Silicate
Sputtered films of Titanium Silicate support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
Industry
Application
Function
Optics and photonics
Antireflective and high-index optical coating stacks
Provides a tunable refractive index layer between silica and titania
Semiconductor manufacturing
Gate and passivation dielectric films
Wide-bandgap oxide layer with improved thermal stability over pure TiO2
Reduces optical interference and reflection losses in display stacks
Architectural and automotive glass
Functional and antireflective glazing coatings
Combines optical performance with acid/base and weathering resistance
Photovoltaics
Antireflective coatings on solar cell surfaces
Lowers surface reflectance to improve light capture and cell efficiency
Optical communications and data storage
Waveguide and optical layer deposition
Precise, reproducible refractive index control across the deposited film
Why Partner with Infinita Materials?
Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Titanium Silicate sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalog target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Other Related Product to Titanium Silicate, Ti0.44Si0.10O
Titanium silicate (Ti₀.₄₄Si₀.₁₀O) is a composite material consisting of titanium and silicon, known for its unique properties and applications in catalysis and environmental remediation.
Due to their excellent stability, electrical properties, and optical characteristics, titanium silicate films are suitable for solar cells, including dye-sensitized solar cells (DSSCs) and thin-film solar cells.
Titanium silicate films have the potential for photocatalytic applications in environmental remediation, such as water purification and air cleaning.
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