Europium titanate (EuTiO3) sputtering targets from Infinita Materials deliver a rare-earth perovskite oxide valued for its quantum paraelectric behaviour and low-temperature antiferromagnetic ordering. Supplied as dense, black perovskite-phase ceramic discs at greater than 99.9% purity, these targets support reproducible thin-film deposition of magnetoelectric and multiferroic oxide layers for advanced materials research. Each target is manufactured to controlled stoichiometry and dimensional tolerance for RF and pulsed-DC magnetron sputtering systems.
Europium Titanate (EuTiO₃) is a cubic perovskite oxide with Eu²⁺ occupying the A-site and Ti⁴⁺ centred in corner-sharing TiO₆ octahedra. At room temperature, it adopts the Pm-3m structure with a lattice parameter of approximately 3.908 Å and transforms to tetragonal I4/mcm below ~282 K. EuTiO₃ exhibits G-type antiferromagnetic ordering below ~5.5 K and strong spin-lattice coupling, producing pronounced magnetodielectric and magnetoelectric behaviour. As a sputtering target, dense, phase-pure EuTiO₃ enables precise Eu: Ti stoichiometry and reproducible thin-film deposition. RF magnetron sputtering is used to fabricate films for strain-engineered ferroelectricity, spintronic heterostructures, magnetoelectric devices, tunable dielectrics, and fundamental studies of correlated oxide systems.
Answer: EuTiO₃ is valued for its unique combination of magnetoelectric coupling, multiferroicity, and quantum paraelectric behavior. These properties make it an excellent candidate for creating thin films in advanced electronic and spintronic devices.
Answer: Although EuTiO₃ nanoparticle thin films are relatively new, they are currently used in many fields, including spintronics, magnetoelectric sensors, and multiferroic devices. Due to their electric, magnetic, and optical characteristics, they are helpful in the cutting-edge domains of contemporary technology, including memory storage, energy harvesting, and optoelectronics.
Answer: Optimal deposition conditions for sputtering EuTiO₃ include precise control over substrate temperature, sputtering power, and oxygen partial pressure. Substrate temperatures usually range from 300°C to 600°C, and maintaining the correct oxygen atmosphere is essential to avoid oxygen vacancies, which can affect the material's properties.
Answer: EuTiO₃ nanoparticle sputtering targets can be used in co-sputtering or combinatorial techniques to create complex oxide heterostructures or composite materials.
Europium Titanate (EuTiO₃) is a cubic perovskite oxide with Eu²⁺ occupying the A-site and Ti⁴⁺ centred in corner-sharing TiO₆ octahedra. At room temperature, it adopts the Pm-3m structure with a lattice parameter of approximately 3.908 Å and transforms to tetragonal I4/mcm below ~282 K. EuTiO₃ exhibits G-type antiferromagnetic ordering below ~5.5 K and strong spin-lattice coupling, producing pronounced magnetodielectric and magnetoelectric behaviour. As a sputtering target, dense, phase-pure EuTiO₃ enables precise Eu: Ti stoichiometry and reproducible thin-film deposition. RF magnetron sputtering is used to fabricate films for strain-engineered ferroelectricity, spintronic heterostructures, magnetoelectric devices, tunable dielectrics, and fundamental studies of correlated oxide systems.
Key Properties of Europium Titanate
Property
Value
Significance
Chemical formula
EuTiO3
Defines the stoichiometric ABO3 perovskite composition of the target material
CAS number
12020-61-0
Unique substance identifier used for procurement, safety, and regulatory documentation
Molar mass
~247.83 g/mol
Basis for stoichiometric process calculations and film thickness/deposition-rate modelling
Governs the octahedral tilt transition underlying the quantum paraelectric dielectric response
Density (theoretical)
~6.9 g/cm3
Informs sputter yield estimation and target mass-loss/lifetime calculations
Melting point
~1850 C
Sets upper thermal limits for target bonding, sintering, and process design
Magnetic ordering
G-type antiferromagnetic below Neel temperature ~5.5 K
Enables magnetically tunable and magnetoelectric functionality in deposited films
Appearance
Black, opaque polycrystalline ceramic
Visual quality-control indicator of oxidation state and perovskite phase purity
Types & Grades of Europium Titanate
Europium Titanate targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
Grade / Form
Typical Purity
Key Features / Uses
Standard grade disc target
99.9% (3N)
General-purpose RF sputtering for multiferroic and dielectric thin-film research
High-purity grade
99.99% (4N)
Reduced trace-metal background for spintronic and quantum-material device layers
Ultra-high-purity grade
99.999% (5N), available on request
Low-defect films for fundamental magnetoelectric coupling and spin-lattice studies
Bonded/backed target
99.9% and higher
Indium- or elastomer-bonded to a copper backing plate for improved thermal management under high sputtering power
Custom and rotary configurations
99.9% – 99.99%
Large-area planar or cylindrical rotary formats for pilot-scale and semi-production coating lines
Applications of Europium Titanate
Sputtered films of Europium Titanate support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
Industry
Application
Function
Quantum materials research
Epitaxial multiferroic thin films
Provides strain-tunable, magnetically ordered dielectric layers for magnetoelectric coupling studies.
Spintronics
Antiferromagnetic spacer and tunnel-barrier layers
Supplies magnetically ordered oxide layers for spin-dependent transport device structures
Microelectronics and RF components
Tunable microwave and dielectric components
Exploits the quantum paraelectric permittivity for voltage- and field-tunable capacitive elements
Semiconductor substrates and heterostructures
Strain-engineered oxide heterostructures
Enables strain-induced room-temperature ferroelectricity when grown on lattice-matched perovskite substrates
Academic and national laboratories
Fundamental condensed-matter physics studies
Delivers stoichiometric, well-characterised films for probing spin-lattice and magnetoelectric coupling
Sensor development
Magnetoelectric sensor coatings
Forms active layers that couple magnetic and electric response for magnetic-field sensing applications
Why Partner with Infinita Materials?
Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Europium Titanate sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Other Related Product to Europium Titanate, EuTiO3
EuTiO₃ is valued for its unique combination of magnetoelectric coupling, multiferroicity, and quantum paraelectric behavior. These properties make it an excellent candidate for creating thin films in advanced electronic and spintronic devices.
Although EuTiO₃ nanoparticle thin films are relatively new, they are currently used in many fields, including spintronics, magnetoelectric sensors, and multiferroic devices. Due to their electric, magnetic, and optical characteristics, they are helpful in the cutting-edge domains of contemporary technology, including memory storage, energy harvesting, and optoelectronics.
Optimal deposition conditions for sputtering EuTiO₃ include precise control over substrate temperature, sputtering power, and oxygen partial pressure. Substrate temperatures usually range from 300°C to 600°C, and maintaining the correct oxygen atmosphere is essential to avoid oxygen vacancies, which can affect the material's properties.
EuTiO₃ nanoparticle sputtering targets can be used in co-sputtering or combinatorial techniques to create complex oxide heterostructures or composite materials.
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