Copper Oxide, CuO
Copper oxide (CuO), also known as cupric oxide or tenorite, is a narrow-bandgap p-type semiconducting ceramic widely used as a sputtering target for gas sensors, photovoltaic absorbers, and superconducting-precursor thin films. Infinita Materials supplies CuO sputtering targets as hot-pressed and sintered ceramic discs and plates across standard and custom geometries, engineered for stable, low-particulate deposition. These targets serve gas sensor manufacturers, thin-film solar research groups, and cuprate superconductor laboratories requiring reproducible film composition.
| Purity (%) : | >99.9 |
| Dimensions : | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction to Copper Oxide
Copper Oxide (CuO) is a cupric copper oxide ceramic that crystallises in a distorted monoclinic structure, with Cu²⁺ ions in approximately square-planar coordination. It is a narrow-bandgap semiconductor with an optical bandgap of approximately 1.2–1.5 eV and exhibits intrinsic p-type conductivity associated with copper vacancies. CuO is chemically stable in air but can lose oxygen and partially reduce toward Cu₂O at elevated temperatures. As a sputtering target, ceramic CuO provides direct stoichiometric control and reproducible film deposition compared with reactive Cu sputtering. RF magnetron sputtering enables uniform thin films for chemiresistive gas sensors, solar-cell heterojunctions, hole-transport layers, and oxide-electronics research, including cuprate superconducting-film development.
FAQs
Introduction to Copper Oxide
Copper Oxide (CuO) is a cupric copper oxide ceramic that crystallises in a distorted monoclinic structure, with Cu²⁺ ions in approximately square-planar coordination. It is a narrow-bandgap semiconductor with an optical bandgap of approximately 1.2–1.5 eV and exhibits intrinsic p-type conductivity associated with copper vacancies. CuO is chemically stable in air but can lose oxygen and partially reduce toward Cu₂O at elevated temperatures. As a sputtering target, ceramic CuO provides direct stoichiometric control and reproducible film deposition compared with reactive Cu sputtering. RF magnetron sputtering enables uniform thin films for chemiresistive gas sensors, solar-cell heterojunctions, hole-transport layers, and oxide-electronics research, including cuprate superconducting-film development.
Key Properties of Copper Oxide
| Property | Value | Significance |
|---|
| Chemical formula | CuO | Confirms the cupric (+2) oxidation state and 1:1 Cu:O stoichiometry, distinct from cuprous Cu2O |
| CAS number | 1317-38-0 | Unique registry identifier for procurement, safety documentation, and regulatory compliance |
| Molar mass | ~79.55 g/mol | Basis for stoichiometric verification and sputter-rate to mass-loss conversions |
| Density (bulk ceramic) | ~6.31-6.32 g/cm3 | Benchmark for sintered target quality; lower relative density reduces sputter yield and raises particulate risk |
| Crystal structure | Monoclinic (tenorite), square-planar Cu-O coordination | Distinguishes CuO from the cubic cuprite structure of Cu2O and governs film nucleation behaviour |
| Thermal stability | Stable to ~1000-1200 C before reducing toward Cu2O; often cited melting point ~1326 C | Sets sputter power and substrate heating limits to avoid unwanted phase reduction in the target |
| Band gap | ~1.2-1.5 eV | Narrow-gap p-type character positions CuO as a visible-light absorber and hole-transport layer. |
| Electrical character | Intrinsic p-type semiconductor (copper-vacancy acceptors) | Enables dopant-free use in p-n heterojunction solar cells and chemiresistive gas sensors |
Types & Grades of Copper Oxide
Copper Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| 2N5-3N hot-pressed disc | 99.5% – 99.9% | Cost-effective grade for general PVD trials, coating durability studies, and early-stage process development |
| 4N sintered ceramic target | 99.99% | Standard grade for gas sensor films and thin-film transistor research requiring reduced trace-metal background |
| 5N ultra-high-purity target | 99.999% | Lowest metallic and particulate contamination for photovoltaic absorber layers and defect-sensitive optoelectronics |
| Rotary/cylindrical target | 99.9% – 99.99% | Extended-life format for high-throughput in-line coaters producing gas-sensing or catalytic films at scale |
| Bonded/segmented planar target | 99.9% – 99.99% | Crack-resistant indium- or elastomer-bonded mounting for high-power magnetron sputtering of brittle ceramic tiles |
Applications of Copper Oxide
Sputtered films of Copper Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Gas sensing | Chemiresistive thin-film gas sensors | Resistance changes reversibly on exposure to H2S, CO, NO2, and ethanol, enabling selective trace-gas detection |
| Photovoltaics | Absorber and hole-transport layer in Cu2O/CuO and CuO/ZnO thin-film solar cells | Narrow band gap and native p-type conductivity absorb visible light and conduct photogenerated holes |
| Semiconductor research | p-type transparent semiconducting oxide films | Provides a dopant-free p-type layer for p-n heterojunction and thin-film transistor device studies |
| Superconductor research | Precursor and calibration layer for high-Tc cuprate superconducting films | Copper oxide forms the CuO2 planes structurally central to YBCO and related cuprate superconductors |
| Catalysis and photocatalysis | Thin-film catalytic and photocatalytic coatings | Supports oxidation-reduction reaction studies and visible-light-driven water splitting research |
| Energy storage | Anode material films for lithium-ion battery research | High theoretical specific capacity of CuO is explored in thin-film battery and supercapacitor prototyping |
Why Partner with Infinita Materials?
- Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
- Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
- Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Copper Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Frequently Asked Questions
What is a CuO (Copper Oxide) sputter target?
CuO sputter targets are solid copper oxide (CuO) materials used as sputtering sources to deposit layers of copper oxide on substrates, such as glass, metal, or semiconductors.
Copper Oxide, CuO
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