Lanthanum Manganate, LaMnO3

Lanthanum Manganate (LaMnO3) sputtering targets from Infinita Materials deliver the undoped parent perovskite of the colossal-magnetoresistance manganite family in dense, high-purity ceramic form. The material combines an orthorhombic, Jahn-Teller-distorted perovskite lattice with antiferromagnetic insulating behaviour, making it a foundational building block for oxide-electronics and spintronic thin-film research. Supplied in standard 1 in and 2 in disc formats or custom configurations, each target is manufactured to consistent stoichiometry and grain density for reliable magnetron and RF sputtering performance.

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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Introduction to Lanthanum Manganate

Lanthanum Manganate LaMnO3 crystallises in an orthorhombic Pnma perovskite structure, with La3+ occupying the A-site and Jahn-Teller-active Mn3+ ions surrounded by MnO6 octahedra. Cooperative octahedral distortion produces orbital ordering and an insulating ground state, while stoichiometric LaMnO3 exhibits A-type antiferromagnetic ordering below approximately 140 K. As the parent compound of hole-doped manganites such as La1-xSrxMnO3, it provides an important reference for studying correlated magnetic and electronic behaviour. As a sputtering target, dense LaMnO3 ceramic enables uniform, stoichiometric thin films for oxide electronics, magnetic multilayers, epitaxial buffer layers, solid oxide fuel cells, and catalytic or photocatalytic coatings.

FAQs

Question: What is Lanthanum Manganate (LaMnO3) used for in sputtering?

Answer: LaMnO3 is used as a sputtering target to deposit thin films for applications in perovskite-based materials, thermistors, resistive switching devices, and oxygen sensors.

Question: What properties make LaMnO3 suitable for sputtering?

Answer: LaMnO3 has high thermal stability, good electrical conductivity, and an appropriate lattice structure for thin film deposition, making it ideal for creating high-quality films in electronic devices.

Question: Can LaMnO3 targets be used in both DC and RF sputtering?

Answer: Depending on the required application and film properties, LaMnO3 targets are compatible with both DC and RF sputtering techniques.

Question: What are the main challenges when using LaMnO3 targets in sputtering?

Answer: Challenges include the target's tendency to degrade under certain conditions and achieving consistent stoichiometric deposition due to variations in the target's material composition during sputtering.