Lanthanum Nickel Oxide, LaNiO3

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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    Catalogue CodeIN-LaNi-01 IN-LaNi-02
    CAS No.12031-18-4
    Chemical FormulaLaNiO3
    Compound NameLanthanum Nickel Oxide
    Purity (%)>99.9
    DimensionsDia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”

    Introduction

    Lanthanum Nickel Oxide (LaNiO3) is an oxide evaporation material with the chemical formula LaMnO3. Due to its high electronic conductivity, stable crystal structure, and fascinating interaction with other materials, LaNiO₃ is increasingly used as a sputtering target in thin-film deposition processes. High-purity LaMnO3 evaporation materials are essential in deposition processes to ensure high-quality deposited film. The lanthanum nickel oxide sputtering target serves thin film deposition, decoration, semiconductors, displays, LEDs, photovoltaic devices, functional coatings, and other applications in optical information storage, glass coatings for car and architectural glass, and optical communication. Its exceptional properties make it an ideal candidate for various electronics, energy storage, and catalysis applications.

    Properties

    The table below contains all the critical properties of Lanthanum Nickel Oxide (LaNiO3) : 

    PropertiesDescription
    Appearance and ShapeSolid, Thin film, Disc 
    Molar mass~ 222.77 g/mol
    Magnetic TypeParamagnetic
    Density~ 6.25 g/cm³ 
    Thermal conductivity ~ 3–5 W/m·K 
    Melting PointDecomposes at ~1,500°C

    Applications

    • Transparent Conductive Films: Employed in optoelectronic devices, providing both conductivity and transparency in thin-film coatings.
    • Magnetic Thin Films: These are used in magnetic storage devices and spintronic applications due to their ferromagnetic properties.
    • Superconducting and Multiferroic Thin Films: Plays a role in creating multifunctional thin films with superconducting and magnetic properties for advanced electronic devices.
    • Electrodes in Solid Oxide Fuel Cells (SOFCs): LaNiO₃ is used as a conductive material in SOFCs due to its good electrical conductivity and stability at high temperatures.
    • Sensors: LaNiO₃’s sensitivity to gases makes it worthwhile in gas sensors, particularly for detecting pollutants like NOx, CO, and hydrocarbons.
    • Thermoelectric Materials: Its ability to conduct electricity while maintaining thermal properties makes it a candidate for thermoelectric devices.
    • Electronic Devices: LaNiO₃ is used in thin films for applications like resistive switching devices and memristors, which are integral in memory storage technologies.

    FAQs

    Queston: What are the main applications of LaNiO3 sputtering targets?

    Answere: LaNiO3 targets are primarily used for depositing thin films in electronics, sensors, and fuel cells, particularly for conducting oxide layers and electrode materials.

    Queston: Why choose LaNiO3 as a sputtering target?

    Answere: LaNiO3 offers high electrical conductivity, thermal stability, and chemical stability, making it suitable for applications requiring high-performance conductive films.

    Queston: What deposition techniques are used for LaNiO3?

    Answere: LaNiO3 is typically deposited using sputtering techniques, including RF sputtering, which allows for precise film thickness and uniformity control.

    Queston: What are the challenges with LaNiO3 sputtering?

    Answere: The main challenges include maintaining a stable deposition rate, minimizing oxidation during sputtering, and ensuring target uniformity and film adhesion.

    1 review for Lanthanum Nickel Oxide, LaNiO3

    1. sachin

      Nice product !!!

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