Lanthanum Strontium Cobalt Oxide

Lanthanum Strontium Cobalt Oxide (LSC/LSCO, La1-xSrxCoO3) sputtering targets for depositing mixed ionic-electronic conductor thin films. This perovskite oxide is a leading cathode and electrode material for solid oxide fuel cells, oxygen sensors, and oxide electronic devices. Targets are sintered to near-theoretical density for stable, low-particulate magnetron sputtering, and are available in standard catalogue sizes or custom stoichiometries and dimensions on request.

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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    Introduction to Lanthanum Strontium Cobalt Oxide

    Lanthanum strontium cobalt oxide (LSC/LSCO), La₁₋ₓSrₓCoO₃, is a perovskite oxide where Sr²⁺ substitution for La³⁺ produces mixed Co³⁺/Co⁴⁺ valence states and oxygen vacancies. This composition-dependent chemistry gives the material strong mixed ionic-electronic conductivity, combining electronic transport with oxygen-ion mobility, while also enabling tunable catalytic, thermal, and magnetic properties. RF or pulsed-DC magnetron sputtering from dense ceramic targets provides uniform, composition-controlled films with precise thickness and oxygen stoichiometry. Sputtered LSC films are widely investigated as cathodes for solid oxide fuel cells, oxygen-permeation membranes, gas sensors, conductive electrodes in ferroelectric and multiferroic stacks, and magnetic oxide layers for spintronic research.

    FAQs

    Question: What is Lanthanum Strontium Cobalt Oxide (LSC) used for in sputtering?

    Answer: La₀.₅Sr₀.₅CoO₃ is commonly used as a sputtering target for thin-film deposition in applications.

    Question: What are the critical properties of LSC?

    Answer: This material is a perovskite oxide with excellent electrical conductivity, thermal stability, and catalytic activity, making it suitable for high-performance applications.

    Question: What are the typical sputtering techniques for La₀.₅Sr₀.₅CoO₃?

    Answer: La₀.₅Sr₀.₅CoO₃ is typically sputtered using RF (radio-frequency) or DC magnetron sputtering techniques, depending on the substrate material and process conditions.

    Question: Are there any challenges with using La₀.₅Sr₀.₅CoO₃ as a sputtering target?

    Answer: Challenges include controlling stoichiometry during deposition and avoiding the formation of undesirable phases at high sputtering power. Proper target preparation and process optimization are required for consistent results.