Lanthanum Strontium Chromate

Lanthanum strontium chromate (La1-xSrxCrO3) sputtering targets, supplied by Infinita Materials, deliver a strontium-doped lanthanum chromite perovskite engineered for thin-film deposition in fuel cell and high-temperature electronic applications. The material’s rare combination of stable electronic conductivity across both oxidising and reducing atmospheres makes it a standard choice for solid oxide fuel cell interconnect and cathode contact layers. Targets are produced as cold-pressed, sintered discs at purities from 99% to 99.999%, with Sr doping level and dimensions customizable to application requirements.

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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Introduction to Lanthanum Strontium Chromate

Lanthanum strontium chromate (LSC), La₁₋ₓSrₓCrO₃, is an orthorhombically distorted perovskite derived from LaCrO₃, with Sr²⁺ substitution for La³⁺ generating mixed Cr³⁺/Cr⁴⁺ valence states and p-type conductivity. Compositions around x = 0.2 offer excellent structural, chemical, and thermal stability, retaining conductivity across oxidising and reducing environments at temperatures exceeding 1000 °C. Sputtering from dense ceramic LSC targets provides precise composition, thickness, and uniformity for demanding high-temperature applications. Sputtered LSC films are particularly valuable as conductive interconnects and contact layers in solid oxide fuel cells, as electrodes for high-temperature gas sensors, and as conducting layers in perovskite oxide heterostructures requiring thermal compatibility and resistance to harsh atmospheres.

FAQs

Question: What is Lanthanum Strontium Chromate (La₁₋ₓSrₓCrO₃)?

Answer: Lanthanum Strontium Chromate is a perovskite oxide material commonly used in thin film deposition via sputtering, especially in electronic, photonic, and energy applications due to its high conductivity and stability.

Question: What is La₁₋ₓSrₓCrO₃ used for in sputtering?

Answer: Due to its high ionic conductivity and structural versatility is used mainly in fabricating oxide-based thin films for sensors, fuel cells, and solid-state devices and as a catalyst in various applications.

Question: What are the advantages of using La₁₋ₓSrₓCrO₃ as a sputtering target?

Answer: La₁₋ₓSrₓCrO₃ offers high thermal stability, electrical conductivity, and a wide range of compositions that can be tailored by adjusting the Sr content, making it ideal for high-performance thin film deposition.

Question: How does the Sr content (x) affect La₁₋ₓSrₓCrO₃ films?

Answer: The Sr content (x) influences the material's electronic properties, including conductivity, crystal structure, and stability, allowing for customization based on the specific requirements of the fabricated device.

Question: What are the challenges associated with La₁₋ₓSrₓCrO₃ sputtering targets?

Answer: Challenges include maintaining consistent stoichiometry during deposition, potential volatility of chromium in high vacuum, and the need for precise control of sputtering parameters to achieve desired film qualities.