Lanthanum titanate (LaTiO3) is a perovskite-structured rare-earth titanium oxide supplied as a high-density sputtering target by Infinita Materials for research and production thin-film deposition. Its combination of a stable oxide lattice, tunable stoichiometric transfer, and correlated-electron behaviour makes it a material of interest across oxide electronics, dielectric coatings, and condensed-matter research.
Lanthanum titanate (LaTiO₃) crystallises in a distorted orthorhombic perovskite structure (Pnma), with La³⁺ occupying the A-site and Ti³⁺ centred in corner-sharing TiO₆ octahedra. Its single 3d electron per Ti³⁺ ion and strong electron correlations make LaTiO₃ a prototypical Mott insulator, with antiferromagnetic ordering below approximately 140 K. RF or pulsed-DC magnetron sputtering from dense ceramic LaTiO₃ targets enables precise La: Ti stoichiometry and uniform thin-film deposition. These films are valuable for correlated-electron oxide heterostructures, interfacial charge-transfer studies, metal-insulator transition research, and dielectric or buffer layers. LaTiO₃ also serves as a parent composition for lithium-substituted titanates investigated in solid-state ion-conducting materials.
Answer: Lanthanum Titanate (LaTiO₃) is a perovskite oxide material with high dielectric properties. It is commonly used in thin-film applications, such as capacitors, piezoelectric devices, and electronic components.
Answer: LaTiO₃ targets are used to fabricate thin films for applications such as capacitors, superconductors, ferroelectric materials, and other advanced electronic components.
Answer: Due to its high dielectric constant, chemical stability, and excellent film quality, LaTiO₃ is ideal for applications requiring controlled thin film deposition with precise electrical properties.
Answer: LaTiO₃ is typically sputtered in a vacuum chamber using a DC or RF sputtering process, depending on the material properties and the desired film characteristics.
Lanthanum titanate (LaTiO₃) crystallises in a distorted orthorhombic perovskite structure (Pnma), with La³⁺ occupying the A-site and Ti³⁺ centred in corner-sharing TiO₆ octahedra. Its single 3d electron per Ti³⁺ ion and strong electron correlations make LaTiO₃ a prototypical Mott insulator, with antiferromagnetic ordering below approximately 140 K. RF or pulsed-DC magnetron sputtering from dense ceramic LaTiO₃ targets enables precise La: Ti stoichiometry and uniform thin-film deposition. These films are valuable for correlated-electron oxide heterostructures, interfacial charge-transfer studies, metal-insulator transition research, and dielectric or buffer layers. LaTiO₃ also serves as a parent composition for lithium-substituted titanates investigated in solid-state ion-conducting materials.
Key Properties of Lanthanum Titanate
Property
Value
Significance
Chemical formula
LaTiO3
Defines the ABO3 perovskite stoichiometry with La3+ at the A site and Ti3+ at the B site
Crystal structure
Orthorhombic perovskite, space group Pnma (GdFeO3-type distortion)
Octahedral tilting from this distortion governs the electronic bandwidth and magnetic exchange pathways
Molar mass
~234.77 g/mol
Used for stoichiometric mass-balance calculations in target fabrication and deposited-film thickness modelling
Density (theoretical)
~6.52 g/cm3
High target density supports stable erosion behaviour and reduces particulate generation during sputtering
Melting point
Above 1800 C
Sets the sintering and hot-pressing temperature window required to densify the ceramic target
Electronic character
Mott insulator; antiferromagnetic ordering below Neel temperature of approximately 140 K
Basis for using LaTiO3 films in correlated-electron and metal-insulator-transition research
Thermal conductivity
~3-5 W/m-K
Moderate value that informs power ramp rates and cooling requirements during magnetron sputtering
Chemical stability
Stable oxide with low-volatility La2O3 and TiO2 constituents
Supports congruent, stoichiometric material transfer from target to substrate during sputtering
Types & Grades of Lanthanum Titanate
Lanthanum Titanate targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
Grade / Form
Typical Purity
Key Features / Uses
Standard ceramic disc target
99.9% (3N)
Cost-effective grade for general PVD process development and pilot-line coating runs
High-purity ceramic target
99.99% (4N)
Reduced trace-metal content for dielectric and microelectronic thin-film work sensitive to contamination
Ultra-high-purity target, custom order
99.999% (5N)
Minimises impurity-driven scattering and defect states for fundamental correlated-oxide research
Bonded target assembly
99.9% and above
Indium- or silver-bonded to a copper backing plate for improved heat removal in high-power magnetron sputtering
Custom geometry (rectangular, planar, or rotary tube)
99.9%-99.99%
Sized for large-area, in-line, or roll-to-roll deposition systems beyond standard disc formats
Applications of Lanthanum Titanate
Sputtered films of Lanthanum Titanate support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
Industry
Application
Function
Microelectronics and semiconductor
High-k dielectric and buffer layers on silicon or oxide substrates
Provides an insulating, chemically compatible perovskite layer for oxide-based device stacks
Energy storage research
Parent lattice for lithium lanthanum titanate (LLTO) solid-electrolyte studies
Supplies the host titanate framework used to investigate lithium-ion conduction pathways
Optics and photonics
High-refractive-index oxide coatings
Delivers a dense, uniform titanate film layer for refractive-index engineering in optical stacks
Condensed-matter and academic research
Epitaxial thin films and superlattices of Mott insulators
Enables controlled study of metal-insulator transitions, spin, and orbital ordering at interfaces
Oxide electronics and superconducting films
Buffer or template layer beneath other functional perovskites
Lattice-matched underlayer that promotes epitaxial growth of related oxide films such as manganites and cuprates
Sensors
Thin-film resistive and chemical sensor elements
Correlated-oxide film responds measurably to environmental or chemical stimuli for sensing platforms.
Why Partner with Infinita Materials?
Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Lanthanum Titanate sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Other Related Product to Lanthanum Titanate, LaTiO3
Lanthanum Titanate (LaTiO₃) is a perovskite oxide material with high dielectric properties. It is commonly used in thin-film applications, such as capacitors, piezoelectric devices, and electronic components.
LaTiO₃ targets are used to fabricate thin films for applications such as capacitors, superconductors, ferroelectric materials, and other advanced electronic components.
Due to its high dielectric constant, chemical stability, and excellent film quality, LaTiO₃ is ideal for applications requiring controlled thin film deposition with precise electrical properties.
LaTiO₃ is typically sputtered in a vacuum chamber using a DC or RF sputtering process, depending on the material properties and the desired film characteristics.
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