Lithium Phosphate, Li3PO4

Lithium Phosphate (Li3PO4) sputtering targets from Infinita Materials are engineered for the reactive deposition of LiPON solid-electrolyte thin films used in next-generation solid-state and thin-film battery stacks. Each target is produced from stoichiometric, phase-pure Li3PO4 ceramic to support stable, low-particulate RF and reactive DC/RF sputtering. Standard 1 in. and 2 in. research discs ship from stock, with custom sizes, bonding, and purity grades available on request. All material is supplied and quality-verified by Infinita Materials.

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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Introduction to Lithium Phosphate

Lithium phosphate (Li₃PO₄) is an orthorhombic, wide-bandgap insulating ceramic composed of PO₄ tetrahedra and Li⁺ ions. Its chemical and thermal stability, low electronic conductivity, and moderate dielectric constant make it suitable for solid-state electrochemical applications. Li₃PO₄ is particularly valuable as a sputtering target because RF magnetron sputtering in a nitrogen-containing plasma can produce lithium phosphorus oxynitride (LiPON), an amorphous solid electrolyte with improved Li⁺ conductivity, strong electronic insulation, and excellent electrochemical stability. Sputtered LiPON layers provide dense, pinhole-free electrolyte films for thin-film and solid-state batteries. Applications include microbatteries for MEMS, wearable and implantable electronics, electrochromic devices, and other miniaturised energy-storage systems.

FAQs

Question: What is Lithium Phosphate (Li₃PO₄) used for in sputtering?

Answer: Due to its high ionic conductivity and stability, Lithium Phosphate is commonly used in sputtering to create thin films for applications like solid-state batteries, thin-film capacitors, and optical coatings.

Question: Why choose Li₃PO₄ as a sputtering target?

Answer: Li₃PO₄ offers excellent thermal stability, a wide electrochemical window, and good substrate adherence, making it ideal for energy storage and semiconductor devices.

Question: What are the advantages of Li₃PO₄ sputtering targets over other materials?

Answer: Compared to other lithium compounds, Li₃PO₄ provides enhanced chemical stability, high purity, and consistent film quality, which is critical for high-performance devices.

Question: What substrates are compatible with Li₃PO₄ sputtering?

Answer: Li₃PO₄ thin films can be deposited on a range of substrates, including glass, silicon, and stainless steel, depending on the intended application.

Question: What is the typical sputtering process for Li₃PO₄?

Answer: The sputtering process involves DC or RF sputtering in an inert gas (usually argon) atmosphere at room temperature, with optimized power settings to achieve high-quality, stoichiometric films.