| Catalogue Code | IN-NiPr-01 IN-NiPr-02 |
| CAS No. | 12037-29-5 |
| Chemical Formula | PrNiO |
| Compound Name | Praseodymium Nickel Oxide |
| Purity (%) | >99.9 |
| Dimensions | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction
Praseodymium Nickel Oxide (PrNiO₃) sputtering target is a specialized material used in the deposition of thin films through the sputtering technique. This compound, consisting of praseodymium (Pr) and nickel (Ni) in an oxygen-rich matrix, exhibits interesting electrical, magnetic, and catalytic properties, making it valuable for various applications, including advanced electronics, superconducting devices, and energy storage technologies. The PrNiO₃ target is particularly noted for its role in producing films that can be used in thermoelectrics, sensors, and as electrodes in electrochemical systems.
Properties
The table below presents the properties of Praseodymium Nickel Oxide (PrNiO₃):
| Property | Description |
| Molar mass | ~179.91 g/mol |
| Density | ~6.7–7.0 g/cm³ |
| Melting Point | ~1400–1500°C |
| Shape and Appearance | Solid, Thin film, Disc |
| Thermal Conductivity | ~2.0–3.0 W/(m·K) |
| Magnetic Properties | Paramagnetic or antiferromagnetic |
Applications
- Memory Devices: PrNiO₃ is an essential material for resistive switching devices, crucial for non-volatile memory technologies.
- Optoelectronics: Its electronic and optical characteristics are ideal for photodetectors and other optoelectronic devices.
- Sensors: PrNiO₃ thin films are employed in gas sensors and pressure-sensitive devices.
- Thermal Management: Utilized in thermochromic applications where temperature-induced changes in properties are beneficial.
- Energy Conversion: PrNiO₃’s tunable electronic properties make it suitable for energy-related applications like catalysts and fuel cells.
- High-Temperature Superconductors: PrNiO₃ thin films are also explored for their potential in high-temperature superconductivity, as they exhibit interesting electrical and magnetic behaviors at elevated temperatures.
FAQs
Answere: PrNiO₃ sputtering targets deposit thin films with tailored electronic, magnetic, and optical properties. These films are critical for applications in memory devices, sensors, and energy conversion technologies.
Answere: PrNiO₃ exhibits unique optical and electronic behaviors, including a metal-insulator transition, making it ideal for optoelectronic devices like photodetectors and modulators.
Answere: PrNiO₃'s perovskite structure, high thermal stability, and tunable electrical properties enable the creation of uniform and functional thin films for advanced technologies.
Answere: Yes, PrNiO₃ exhibits a metal-to-insulator transition depending on temperature, pressure, and doping, which is valuable for memory and sensing applications.
Answere: The material's ability to facilitate catalytic reactions and its mixed-valence states of nickel enable effective energy conversion and storage processes in applications like fuel cells and thermochromic devices.
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