Introduction to Erbium Oxide
Erbium Oxide (Er₂O₃) crystallises in the cubic bixbyite structure (Ia-3) and contains Er³⁺ ions occupying two distinct six-coordinate sites. It offers excellent thermal and chemical stability, a high refractive index, broad optical transparency, and characteristic Er³⁺ 4f–4f optical transitions near 1.5 μm, making it attractive for photonic applications. As an electrically insulating ceramic, Er₂O₃ is typically deposited using RF or RF-reactive magnetron sputtering from dense ceramic targets, enabling uniform, adherent films with precise thickness and stoichiometric control. Sputtered Er₂O₃ films are investigated for optical waveguides and amplifiers, infrared and anti-reflective coatings, high-k dielectric layers, and protective coatings on silicon, glass, polymers, and metal substrates.
Types & Grades of Erbium Oxide
Erbium Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| 2N (99%) | 99% | Technical grade for decorative coatings, pigment research, and non-critical protective films |
| 3N (99.9%) | 99.9% | Standard grade matching Infinita catalogue codes IN-Er-01/IN-Er-02, suited to general dielectric and anti-reflective coating work |
| 3N5-4N (99.95%-99.99%) | 99.95%-99.99% | High-purity grade for optical coating and electronic thin-film applications sensitive to trace metal contamination |
| 5N (99.999%) | 99.999% | Ultra-high-purity grade for photonic-grade doping, laser host research, and upconversion phosphor studies |
| Custom compositions | Custom on request | Tailored stoichiometry, doped, or reduced-oxygen formulations for speciality reactive sputtering processes |
Applications of Erbium Oxide
Sputtered films of Erbium Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Telecommunications and photonics | Erbium-doped waveguide amplifier (EDWA) films | Provides the Er3+ gain medium host active at the 1.5-microliter C-band used in optical fibre communications |
| Semiconductor research | High-k gate dielectric thin films | Serves as an alternative to silicon dioxide with a higher dielectric constant for reduced gate leakage in device research |
| Optics and laser systems | Anti-reflective and protective IR coatings | Forms a durable, transparent optical layer on infrared and laser system components |
| Displays and lighting | Upconversion and infrared phosphor host films | Converts absorbed infrared photons to visible emission through Er3+ energy-transfer transitions |
| Nuclear and specialty ceramics | Neutron-interaction coatings and ceramic components | Leverages erbium’s rare-earth nuclear cross-section properties in specialised shielding and component research |
| Materials and spintronics research | Paramagnetic oxide thin films | Supports magnetic and magneto-optic thin-film studies enabled by the paramagnetic Er3+ ion |
Take the Next Step
Infinita Materials fabricates Erbium Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
