Indium Aluminum Zinc Oxide, In2O3/Al2O3/ZnO 65/16/19 wt%

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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    Catalogue CodeIN-AlInZn-01 IN-AlInZn-02
    Chemical FormulaIn2O3/Al2O3/ZnO 65/16/19 wt%
    Compound NameIndium Aluminum Zinc Oxide
    Purity (%)>99.9
    DimensionsDia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”

    Introduction

    Indium aluminum zinc oxide sputtering targets are made up of indium oxide, aluminum oxide, and zinc oxide with the chemical formula In2O3/Al2O3/ZnO. The composition ratios are 65, 16, and 19 wt%, respectively. High-purity indium aluminum zinc oxide sputtering targets are essential in deposition operations to ensure a high-quality deposited layer. IAZO has a cubic crystal structure with a lattice parameter of approximately 10.15 Å. The crystal structure of IAZO can be described as a substitutional solid solution of In₂O₃, Al₂O₃, and ZnO, where some indium atoms are replaced by aluminum and zinc atoms.  

    Properties

    The table below contains all the critical properties of  Indium aluminum zinc oxide : 

    PropertiesIndium OxideAluminum Oxide Zinc Oxide 
    Chemical FormulaIn₂O₃Al₂O₃,ZnO
    AppearanceYellowish to transparentWhite, crystalline powderWhite or yellow powder
    Molar mass277.64 g/mol101.96 g/mol81.38 g/mol
    Magnetic TypeDiamagneticDiamagneticDiamagnetic
    Density~ 9-10 g/cm³~ 9-10 g/cm³~8.5 g/cm³
    Melting Point~ 1,910 °C2,072 °C1,975 °C

    Applications

    Indium aluminum zinc oxide (IAZO) is a transparent conducting oxide (TCO) with excellent electrical and optical properties, making it ideal for use in optoelectronics, solar cells, and touch panels:

    • Optoelectronics: IAZO’s high electron mobility, good transparency, and low resistivity make it ideal for optoelectronics.
    • Solar cells: IAZO’s excellent electrical and optical properties make it ideal for solar cells.
    • Touch panels: IAZO’s excellent electrical and optical properties make it ideal for touch panels.
    • Transparent Conductive Films (TCFs): Used in touch screens, displays, and solar cells for high transparency and electrical conductivity.
    • Thin-film transistors (TFTs): Employed in active-matrix displays like OLED and LCD due to their high mobility and low processing temperatures.
    • Semiconductor Devices: Applied in flexible electronics for high-performance and low-cost semiconductor layers.
    • Gas Sensors: Utilized in environmental monitoring to detect gases like ozone and hydrogen.

    FAQs

    Queston: What deposition techniques are used with IAZO sputtering targets?

    Answere: IAZO targets are typically used in physical vapor deposition (PVD) processes such as RF or DC magnetron sputtering.

    Queston: What factors influence the quality of thin films deposited using IAZO?

    Answere: The quality of IAZO thin films depends on parameters like: Substrate temperature Sputtering power and pressure Gas composition (e.g., argon and oxygen ratio)

    Queston: What are typical specifications for IAZO sputtering targets?

    Answere: IAZO targets come in various sizes, compositions, and purities (e.g., >99.9%). The exact specifications depend on the application and equipment used.

    1 review for Indium Aluminum Zinc Oxide, In2O3/Al2O3/ZnO 65/16/19 wt%

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