Lanthanum scandium oxide (LaScO3) is a perovskite-structured rare-earth oxide supplied as a high-purity ceramic sputtering target by Infinita Materials for thin-film deposition. As the largest-lattice-parameter member of the rare-earth scandate family, it combines a wide bandgap and elevated dielectric constant with strong thermal and chemical stability, properties that are difficult to access in bulk single-crystal form.
Lanthanum scandium oxide (LaScO₃) crystallises in a distorted orthorhombic GdFeO₃-type perovskite structure (Pbnm/Pnma), with La³⁺ occupying the A-site and Sc³⁺ centred in ScO₆ octahedra. Its large lattice parameter, wide bandgap, high dielectric constant, and exceptional thermal and chemical stability make it attractive for advanced oxide electronics. As a sputtering target, dense ceramic LaScO₃ enables precise La: Sc stoichiometry, uniform thickness, and reliable thin-film deposition. RF magnetron sputtering is particularly suitable for this insulating ceramic. Sputtered LaScO₃ films are investigated as high-k gate dielectrics, large-lattice-parameter buffer and interface layers for perovskite heterostructures, photovoltaic buffer layers, optical coatings, and insulating layers in high-temperature oxide devices.
Answer: LaScO₃ is used as a target material in thin film deposition processes, particularly for applications in optoelectronics, sensors, and high-temperature superconductors due to its high thermal stability and unique electrical properties.
Answer: LaScO₃ offers excellent electrical insulating properties, high dielectric constant, and resistance to high temperatures, making it ideal for semiconductor and optical coatings.
Answer: LaScO₃ is commonly used in RF (radio frequency) and DC sputtering techniques to deposit thin films onto substrates in various industries, such as electronics and optics.
Answer: Challenges include potential target erosion, the difficulty of achieving consistent deposition rates, and ensuring that the LaScO₃ target remains stable under the high-energy conditions of sputtering processes.
Answer: The high purity and stoichiometric composition of LaScO₃ help produce uniform, high-quality thin films with consistent material properties, which is crucial for advanced device performance.
Lanthanum scandium oxide (LaScO₃) crystallises in a distorted orthorhombic GdFeO₃-type perovskite structure (Pbnm/Pnma), with La³⁺ occupying the A-site and Sc³⁺ centred in ScO₆ octahedra. Its large lattice parameter, wide bandgap, high dielectric constant, and exceptional thermal and chemical stability make it attractive for advanced oxide electronics. As a sputtering target, dense ceramic LaScO₃ enables precise La: Sc stoichiometry, uniform thickness, and reliable thin-film deposition. RF magnetron sputtering is particularly suitable for this insulating ceramic. Sputtered LaScO₃ films are investigated as high-k gate dielectrics, large-lattice-parameter buffer and interface layers for perovskite heterostructures, photovoltaic buffer layers, optical coatings, and insulating layers in high-temperature oxide devices.
Key Properties of Lanthanum Scandium Oxide
Property
Value
Significance
Chemical formula
LaScO3
Confirms the 1:1:3 La: Sc:O stoichiometry of a simple ABO3 perovskite oxide
Basis for use as an alternative gate dielectric and insulating buffer layer in oxide-electronics research
Thermal conductivity
~9 W/m-K
Moderate value that informs power ramp rates and cooling requirements during magnetron sputtering
Lattice position in RE-scandate family
Largest unit cell/pseudocubic lattice constant among rare-earth scandates (La > Nd > Sm > Gd > Dy)
Enables lattice matching to oxide films that require a larger pseudocubic lattice constant than smaller-cation scandates provide
Types & Grades of Lanthanum Scandium Oxide
Lanthanum Scandium Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
Grade / Form
Typical Purity
Key Features / Uses
Standard ceramic disc target
99.9% (3N)
Cost-effective grade for general RF/DC magnetron sputtering and process development
High-purity ceramic target
99.99% (4N)
Reduced trace-metal content for dielectric and semiconductor-grade thin-film work
Ultra-high-purity target, custom order
99.999% (5N)
Minimises impurity-driven defect states for high-k dielectric and oxide-electronics research
Bonded target assembly
99.9% and above
Ceramic disc bonded to a metal backing plate for improved heat removal on high-power production sputter systems
Custom geometry (rectangular, ring, or rotary tube)
99.9%-99.999%
Sized for large-area, in-line, or specialised deposition chambers beyond standard disc formats
Applications of Lanthanum Scandium Oxide
Sputtered films of Lanthanum Scandium Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
Industry
Application
Function
Semiconductor and microelectronics
High-k gate dielectric research
Provides a wide-bandgap insulating oxide layer with a higher dielectric constant than SiO2 to reduce gate leakage
Oxide electronics
Buffer and interface layers for perovskite oxide heterostructures
Supplies a large pseudocubic lattice constant for strain engineering and interfacial charge studies
Optics and photonics
High-index dielectric thin-film coatings
Contributes a stable, wide-bandgap oxide layer to multilayer optical stacks
Photovoltaics
Buffer and passivation layers in oxide-based cell stacks
Improves interface quality and chemical stability against adjacent functional layers
Solid oxide fuel cells
Insulating and barrier oxide layers
Adds a chemically stable perovskite oxide layer compatible with high-temperature cell operation
Academic and materials research
Thin-film deposition for structural and dielectric property studies
Enables reproducible, stoichiometric LaScO3 films for characterisation without bulk single-crystal growth
Why Partner with Infinita Materials?
Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Lanthanum Scandium Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Other Related Product to Lanthanum Scandium Oxide, LaScO3
LaScO₃ is used as a target material in thin film deposition processes, particularly for applications in optoelectronics, sensors, and high-temperature superconductors due to its high thermal stability and unique electrical properties.
LaScO₃ offers excellent electrical insulating properties, high dielectric constant, and resistance to high temperatures, making it ideal for semiconductor and optical coatings.
LaScO₃ is commonly used in RF (radio frequency) and DC sputtering techniques to deposit thin films onto substrates in various industries, such as electronics and optics.
Challenges include potential target erosion, the difficulty of achieving consistent deposition rates, and ensuring that the LaScO₃ target remains stable under the high-energy conditions of sputtering processes.
The high purity and stoichiometric composition of LaScO₃ help produce uniform, high-quality thin films with consistent material properties, which is crucial for advanced device performance.
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