Lead Lanthanum Zirconium Titanate, PLZT, Pb1-xLax(ZryTi1- y)1-0.25xO3

Lead lanthanum zirconium titanate (PLZT) sputtering targets from Infinita Materials supply the lanthanum-modified lead zirconate titanate ceramic needed to deposit transparent electro-optic and piezoelectric thin films at wafer scale. Supplied as precision-machined discs in standard 1 in and 2 in diameters, each target is fabricated to controlled composition, density, and grain size to support stable RF and pulsed-DC magnetron sputtering.

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
Request a Quote ➔

Introduction to Lead Lanthanum Zirconium Titanate

PLZT (lanthanum-doped lead zirconate titanate) retains the perovskite ABO₃ structure of PZT, with La³⁺ partially substituting for Pb²⁺ and creating A-site vacancies that modify ferroelectric domain behaviour. This enables improved optical transparency while retaining useful piezoelectric, ferroelectric, and electro-optic properties. PLZT composition strongly influences its phase, dielectric response, and electro-optic performance, making precise La and Zr control essential. RF magnetron sputtering from dense ceramic PLZT targets provides uniform, composition-controlled thin films on silicon, sapphire, and platinised substrates. These films are used in electro-optic shutters, waveguide modulators, Q-switches, piezoelectric MEMS actuators, sensors, ferroelectric memory, and pyroelectric detector applications requiring wafer-scale integration.

FAQs

Question: What is PLZT used for in sputtering applications?

Answer: PLZT sputtering targets are primarily used to produce thin films for applications such as capacitors, actuators, sensors, and electro-optical devices.

Question: What are the critical properties of PLZT?

Answer: PLZT is a ferroelectric material with high dielectric constants and excellent piezoelectric properties. It is also known for its high electro-optical response.

Question: What is the typical composition of a PLZT sputtering target?

Answer: The standard composition of PLZT is usually a solid solution of lead (Pb), lanthanum (La), zirconium (Zr), and titanium (Ti), with specific ratios varying depending on the desired properties.

Question: What types of sputtering techniques can PLZT targets use?

Answer: PLZT sputtering targets are commonly used in RF (Radio Frequency) and DC sputtering systems to deposit thin films on substrates.

Question: What are the benefits of using PLZT in thin film deposition?

Answer: PLZT offers high piezoelectric and ferroelectric properties, making it ideal for applications in microelectromechanical systems (MEMS), non-volatile memories, and optical devices.