Lead Zirconium Titanate, PZT, PbZr0.52Ti0.48O3

Lead zirconium titanate (PZT) sputtering targets from Infinita Materials supply the archetypal ferroelectric perovskite oxide used to deposit high-performance piezoelectric thin films for MEMS, memory, and transducer applications. Each target is fabricated at the industry-standard morphotropic phase boundary composition, PbZr0.52Ti0.48O3, and supplied as precision-machined discs in standard 1 in and 2 in diameters.

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
Request a Quote ➔

Introduction to Lead Zirconium Titanate

PZT (lead zirconate titanate) crystallises in the perovskite ABO₃ structure, with Pb²⁺ occupying the A-site and Zr⁴⁺/Ti⁴⁺ sharing the B-site. Near the morphotropic phase boundary (~52% Zr/48% Ti), coexisting tetragonal and rhombohedral phases produce enhanced piezoelectric, dielectric, and electromechanical properties. Below its Curie temperature of approximately 350–390 °C, PZT exhibits strong ferroelectric, piezoelectric, and pyroelectric behaviour. Sputtering from dense ceramic PZT targets enables controlled Zr/Ti and Pb stoichiometry, uniform thickness, and wafer-scale integration. PZT thin films are widely used in piezoelectric MEMS actuators, FeRAM capacitors, micromachined ultrasonic transducers, sensors, and other ferroelectric devices requiring precise, patterned thin-film architectures.

FAQs

Question: What is PbZr₀.₅₂Ti₀.₄₈O₃ used for?

Answer: PbZr₀.₅₂Ti₀.₄₈O₃, a piezoelectric and ferroelectric material, is widely used in thin-film applications such as sensors, actuators, and non-volatile memory devices.

Question: What sputtering techniques are compatible with PbZr₀.₅₂Ti₀.₄₈O₃?

Answer: Due to its dielectric properties, it is compatible with RF magnetron sputtering and pulsed DC sputtering.

Question: What precautions are needed during sputtering?

Answer: To avoid lead volatilization, maintain controlled substrate temperature and deposition conditions, and consider reactive gas environments like oxygen to ensure stoichiometry.

Question: How is the target quality maintained?

Answer: High-density sintered targets with minimal porosity are preferred for uniform deposition, minimizing cracking and contamination during sputtering.

Question: Can PbZr₀.₅₂Ti₀.₄₈O₃ targets be customized?

Answer: Yes, targets can be tailored in size, thickness, and doping levels to suit specific thin-film deposition requirements.