| Catalogue Code | IN-Mg-01 IN-Mg-02 |
| CAS No. | 1309-48-4 |
| Chemical Formula | MgO |
| Compound Name | Magnesium Oxide |
| Purity (%) | >99.9 |
| Dimensions | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction
Magnesium Oxide (MgO) targets are primarily used in thin film deposition and material coatings, particularly for their high melting point and ability to maintain structural integrity under intense sputtering conditions. A magnesium oxide sputtering target is a high-quality oxide sputtering material that contains a precise amount of magnesium and oxygen. Magnesium oxide sputtering targets are made by casting pure magnesium and oxygen in a vacuum environment, resulting in a dense and uniform material structure with excellent mechanical properties and chemical stability.
Properties
The table below contains all the critical properties of MgO:
| Properties | Description |
| Appearance | White powder or crystalline solid |
| Molar mass | ~ 40.304 g/mol |
| Magnetic Type | Diamagnetic |
| Density | ~ 3.58 g/cm³ |
| Thermal conductivity | ~ 30 W/m·K |
| Melting Point | ~2,800°C |
Applications
- Protective Coatings: Due to their hardness and chemical stability, MgO is a protective layer in optical lenses, mirrors, and other surfaces exposed to harsh environments.
- Buffer Layers in Superconductors: MgO is often employed as a buffer layer in high-temperature superconductors, such as YBCO, to improve film quality.
- Magnetic and Optical Coatings: Serves as a substrate for the deposition of magnetic or optical coatings, particularly in high-precision applications.
- Barrier Layers: Utilized in solar cell manufacturing, acting as a barrier layer to prevent diffusion between layers.
- Cathode Ray Tubes (CRT): Employed in producing phosphor screens and as an insulating material in CRTs.
FAQs
Answere: Due to its high resistivity and insulating properties, MgO is commonly used as a sputtering target for thin film deposition in semiconductor fabrication, optical coatings, and dielectric layers.
Answere: MgO offers high purity, thermal stability, and excellent chemical resistance, making it ideal for producing high-quality thin films with consistent properties during sputtering processes.
Answere: MgO sputtering targets provide excellent adhesion to substrates and high film uniformity, making them particularly useful for creating insulating layers in electronic and photonic devices.
Answere: The optimal temperature varies depending on the application, but MgO films are typically deposited between 200°C and 600°C, depending on the desired properties and target material.
Answere: MgO targets should be handled with care to avoid contamination. They must be stored in a dry environment and protected from direct exposure to moisture or high temperatures, which could degrade their properties.
sachin
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