Manganese cobalt oxide (MnCo2O4) is a mixed transition-metal spinel oxide supplied by Infinita Materials as a high-purity sputtering target for thin-film deposition. Its combination of tunable electrical conductivity, thermal stability, and a cubic spinel lattice makes it a material of choice for negative-temperature-coefficient (NTC) thermistor films and protective conducting coatings on metallic fuel-cell interconnects. Targets are offered in standard catalogue discs as well as custom sizes and bonded formats to match production tooling.
Manganese Cobalt Oxide MnCo₂O₄ crystallises in a cubic spinel structure (Fd-3m), with Mn and Co cations distributed between tetrahedral and octahedral sites within a close-packed oxygen lattice. Its mixed-valence chemistry enables hopping-type electrical conduction, producing a strong negative temperature coefficient of resistance (NTC) suitable for thermistor applications. MnCo₂O₄ also offers excellent chemical and structural stability at elevated temperatures and can provide thermal-expansion compatibility with ferritic stainless steels. Sputtering from dense ceramic targets enables uniform, stoichiometric films with controlled Mn: Co composition. These films are used as NTC thermistor sensing layers and as electrically conductive, chromium-diffusion-blocking protective coatings for solid oxide fuel cell interconnects and other high-temperature components.
Answer: Yes, MnCo₂O₄ sputter targets are used to produce thin films suitable for electronics. These films can be deposited onto flexible substrates for sensors, displays, and energy storage solutions.
Answer: MgCo₂O₄ has various applications in energy storage electrodes, magnetic thin films, dielectric materials, catalytic coatings, transparent and conductive oxides, and protective coatings in various industrial processes.
Answer: High-purity MnCo₂O₄ sputter targets are essential for achieving uniform and high-quality films. Impurities in the target material can lead to defects in the deposited films, affecting their electrical, magnetic, and optical properties. These are critical for advanced electronics, energy storage, and optoelectronics applications.
Answer: MnCo2O4 is a semiconducting oxide, so RF sputtering is the default and most reliable approach across target lots. Some higher-conductivity, well-sintered target batches can support DC or DC-pulsed sputtering; confirm target resistivity with Infinita Materials before configuring a DC process.
Manganese Cobalt Oxide MnCo₂O₄ crystallises in a cubic spinel structure (Fd-3m), with Mn and Co cations distributed between tetrahedral and octahedral sites within a close-packed oxygen lattice. Its mixed-valence chemistry enables hopping-type electrical conduction, producing a strong negative temperature coefficient of resistance (NTC) suitable for thermistor applications. MnCo₂O₄ also offers excellent chemical and structural stability at elevated temperatures and can provide thermal-expansion compatibility with ferritic stainless steels. Sputtering from dense ceramic targets enables uniform, stoichiometric films with controlled Mn: Co composition. These films are used as NTC thermistor sensing layers and as electrically conductive, chromium-diffusion-blocking protective coatings for solid oxide fuel cell interconnects and other high-temperature components.
Key Properties of Manganese Cobalt Oxide
Property
Value
Significance
Crystal structure
Cubic spinel (Fd-3m), partially inverse cation distribution
Governs cation site occupancy and resulting electrical/magnetic behaviour of sputtered films
Chemical formula
MnCo2O4
Mixed Mn-Co spinel oxide; stoichiometry control is critical to NTC and conductivity performance
Molar mass
~236.80 g/mol
Used for stoichiometric process calculations and deposition rate modelling
Electrical behavior
Semiconducting, negative temperature coefficient (NTC) of resistance
Basis for thermistor sensing films; conduction via Mn/Co small-polaron hopping
Magnetic character
Ferrimagnetic / ferromagnetic-type ordering at low temperature
Relevant to spintronic and magnetic thin-film research applications
Thermal stability
Stable in air to above 800 C
Compatible with SOFC operating and interconnect processing temperatures
Thermal expansion
Tunable via Mn: Co ratio to approximate ferritic stainless steel
Minimises coating spallation on metallic SOFC interconnects during thermal cycling
Sputtering behaviour
RF and RF-reactive sputtering typical; DC feasible for higher-conductivity target lots.
Target conductivity varies with sintering atmosphere and stoichiometry, affecting power supply choice.
Types & Grades of Manganese Cobalt Oxide
Manganese Cobalt Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
Grade / Form
Typical Purity
Key Features / Uses
Standard catalogue disc
99.9%
1 in x 0.125 in and 2 in x 0.25in stock discs for lab-scale deposition and process development
High-purity grade
99.99%
Reduced transition-metal and alkali impurities for sensor and low-noise thin-film research
Large-format / custom
99.9% – 99.99%
Rectangular tiles and discs up to 14 in diameter for pilot-line and production coaters
Bonded assembly
99.9% – 99.99%
Target bonded to Cu backing plate with In or elastomer bond for magnetron systems requiring high cooling efficiency
Custom stoichiometry / doped
99.9%, custom Mn: Co ratio
Adjusted Mn: Co ratio or Cr/Cu/Ce doping produced to match specific thermistor B-value or coating conductivity targets
Applications of Manganese Cobalt Oxide
Sputtered films of Manganese Cobalt Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
Industry
Application
Function
Sensors
Thin-film NTC temperature sensors
Provides resistance that varies predictably and steeply with temperature for compact sensing elements
Energy/fuel cells
Protective coatings on SOFC metallic interconnects
Blocks chromium outward diffusion while maintaining electrical contact between cells
Electronics
Thermal management and calibration components
Enables integration of thermistor films directly onto microelectronic substrates
Aerospace
Thermal protection and sensing coatings
Combines oxidation resistance with stable, temperature-dependent electrical response
Research/academia
Spinel oxide and mixed-valence oxide thin-film studies
Model system for studying cation-site conduction and magnetic ordering in spinel oxides
Energy storage
Electrode and catalyst-layer thin films
Mixed Mn/Co valence states support oxygen electrocatalysis and pseudocapacitive behaviour in thin-film form.
Why Partner with Infinita Materials?
Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Manganese Cobalt Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Other Related Product to Manganese Cobalt Oxide, MnCo2O4
Yes, MnCo₂O₄ sputter targets are used to produce thin films suitable for electronics. These films can be deposited onto flexible substrates for sensors, displays, and energy storage solutions.
MgCo₂O₄ has various applications in energy storage electrodes, magnetic thin films, dielectric materials, catalytic coatings, transparent and conductive oxides, and protective coatings in various industrial processes.
High-purity MnCo₂O₄ sputter targets are essential for achieving uniform and high-quality films. Impurities in the target material can lead to defects in the deposited films, affecting their electrical, magnetic, and optical properties. These are critical for advanced electronics, energy storage, and optoelectronics applications.
MnCo2O4 is a semiconducting oxide, so RF sputtering is the default and most reliable approach across target lots. Some higher-conductivity, well-sintered target batches can support DC or DC-pulsed sputtering; confirm target resistivity with Infinita Materials before configuring a DC process.
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