Manganese Oxide, MnO2
Manganese oxide, supplied by Infinita Materials in its MnO2 (manganese dioxide) form, is a black-to-brown transition-metal oxide ceramic valued for its semiconducting behaviour, high theoretical charge-storage capacity, and catalytic activity. As a sputtering target, it enables reproducible deposition of manganese oxide thin films for energy-storage, sensing, and functional-coating applications.
| Purity (%) : | >99.9 |
| Dimensions : | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction to Manganese Oxide
Manganese Oxide MnO₂ commonly crystallises in the tetragonal rutile-derived pyrolusite (β-MnO₂) structure, featuring interconnected MnO₆ octahedra and Mn⁴⁺ chemistry. Its polymorphism, defect chemistry, and variable electronic properties enable tunable conductivity and surface reactivity. MnO₂ decomposes upon heating rather than melting congruently, releasing oxygen and forming lower manganese oxides. As a nonmetallic semiconductor, MnO₂ is typically deposited using RF or pulsed-DC magnetron sputtering from ceramic targets. Sputtered films provide uniform, adherent, composition-controlled coatings for energy and sensing applications. They are investigated for pseudocapacitors and micro-supercapacitors, thin-film battery cathodes, catalytic and electrocatalytic layers, gas sensors, resistive-switching devices, and memristive structures.
FAQs
Question: What is a MnO₂ sputter target?
Answer: MnO₂ sputter target is a high-purity material used in sputter deposition, a type of thin-film deposition. The MnO₂ target deposits manganese oxide films onto substrates, commonly used in applications such as batteries, sensors, and semiconductors.
Question: How to handle and store MnO₂ sputter targets?
Answer: Sputter targets of MnO₂ should be kept in a clean and dry environment to avoid contamination. They should be kept away from moisture and other contaminants that can affect the degradability of the target's quality. When handling, put on gloves to prevent oils and residue in your hands from contaminating the target.
Question: Should MnO2 targets be run with RF or DC sputtering?
Answer: Because MnO2 is a semiconducting ceramic rather than a metal, RF magnetron sputtering is the standard approach; pulsed-DC or reactive DC sputtering can also be used in production settings with appropriate arc-suppression and process control.
Introduction to Manganese Oxide
Manganese Oxide MnO₂ commonly crystallises in the tetragonal rutile-derived pyrolusite (β-MnO₂) structure, featuring interconnected MnO₆ octahedra and Mn⁴⁺ chemistry. Its polymorphism, defect chemistry, and variable electronic properties enable tunable conductivity and surface reactivity. MnO₂ decomposes upon heating rather than melting congruently, releasing oxygen and forming lower manganese oxides. As a nonmetallic semiconductor, MnO₂ is typically deposited using RF or pulsed-DC magnetron sputtering from ceramic targets. Sputtered films provide uniform, adherent, composition-controlled coatings for energy and sensing applications. They are investigated for pseudocapacitors and micro-supercapacitors, thin-film battery cathodes, catalytic and electrocatalytic layers, gas sensors, resistive-switching devices, and memristive structures.
Key Properties of Manganese Oxide
| Property | Value | Significance |
|---|
| Chemical formula | MnO2 | Defines target stoichiometry and the Mn(IV) oxide phase deposited in the resulting film |
| Crystal structure | Tetragonal, rutile-derived (beta-MnO2/pyrolusite), P4_2/mnm | Governs target grain structure, sputter yield uniformity, and the tunnel-type framework inherited by crystalline films |
| Molar mass | ~86.94 g/mol | Used to calculate target mass, deposition rate, and film thickness from sputtered material flux |
| Density (theoretical) | ~5.03 g/cm3 | Higher-density, well-sintered targets sputter more uniformly and resist cracking under thermal load. |
| Electrical behavior | Semiconducting oxide; resistivity strongly process-dependent | Determines whether RF or reactive/pulsed-DC magnetron sputtering is required for stable plasma operation |
| Optical/electronic band gap | Reported ~0.25-1.9 eV depending on polymorph and defect content | Relevant to sensor, resistive-switching, and semiconductor-junction film applications |
| Magnetic nature | Non-magnetic at room temperature (bulk) | Compatible with standard magnetron magnetic field configuration without target-thickness derating typical of ferromagnetic metals |
| Thermal stability | Decomposes near 535 C (995 F) rather than melting congruently, releasing oxygen toward Mn2O3 | Limits maximum sustained target/substrate process temperature and informs bonding-material selection. |
Types & Grades of Manganese Oxide
Manganese Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| Standard catalogue disc (IN-Mn-01) | 99.9% | 1 in. dia. x 0.125 in. thick; stocked size for lab-scale RF sputtering systems and process development |
| Standard catalogue disc (IN-Mn-02) | 99.9% | 2 in. dia. x 0.25 in. thick; common size for research and small-batch production chambers |
| High-purity grade | 99.99% | Reduced trace-metal content for electronic, sensor, and energy-storage films sensitive to contamination |
| Large-format / custom planar | 99.9% – 99.99% | Rectangular and oversized discs machined to customer drawings for pilot-line and production-scale coaters |
| Bonded assembly | 99.9% – 99.99% (target material) | Ceramic MnO2 tile diffusion- or solder-bonded to a copper or aluminium backing plate for improved thermal conduction in high-power sputtering |
Applications of Manganese Oxide
Sputtered films of Manganese Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Energy storage | Thin-film pseudocapacitor and micro-supercapacitor electrodes | Provides a high surface-area, redox-active manganese oxide layer for reversible charge storage |
| Batteries | Thin-film and microbattery cathode layers | Supplies a manganese-oxide-based lithium-insertion host material for solid-state and thin-film cells |
| Sensors | Gas and chemical sensor active layers | Semiconducting film response to adsorbed gas species enables resistive-type sensing. |
| Catalysis/electrocatalysis | Oxygen reduction/evolution and catalytic coatings | Mn(IV)/Mn(III) surface redox chemistry drives catalytic activity in deposited films |
| Electronics/memory research | Resistive-switching and memristive test structures | Oxygen-vacancy-mediated conduction supports filamentary switching behaviour in MnOx films |
| Protective and functional coatings | Wear- and corrosion-resistant oxide overlayers | Hard, chemically stable oxide layer for surface protection on research and industrial substrates |
Why Partner with Infinita Materials?
- Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
- Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
- Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Manganese Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Frequently Asked Questions
What is a MnO₂ sputter target?
MnO₂ sputter target is a high-purity material used in sputter deposition, a type of thin-film deposition. The MnO₂ target deposits manganese oxide films onto substrates, commonly used in applications such as batteries, sensors, and semiconductors.
How to handle and store MnO₂ sputter targets?
Sputter targets of MnO₂ should be kept in a clean and dry environment to avoid contamination. They should be kept away from moisture and other contaminants that can affect the degradability of the target's quality. When handling, put on gloves to prevent oils and residue in your hands from contaminating the target.
Should MnO2 targets be run with RF or DC sputtering?
Because MnO2 is a semiconducting ceramic rather than a metal, RF magnetron sputtering is the standard approach; pulsed-DC or reactive DC sputtering can also be used in production settings with appropriate arc-suppression and process control.
Manganese Oxide, MnO2
Used in Various Industries
Biomedical
Energy
Aerospace
Automotive
Healthcare
Electronics
