| Catalogue Code | IIN-Mo-01 IN-Mo-02 |
| CAS No. | 1313-27-5 |
| Chemical Formula | MoO3 |
| Compound Name | Molybdenum Oxide |
| Purity (%) | >99.9 |
| Dimensions | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction
Molybdenum Oxide (MoO₃) sputter targets are used in thin-film deposition processes to create high-quality molybdenum trioxide (MoO₃) films, valued for their unique optical, electrical, and chemical properties. MoO₃ is deposited through reactive sputtering in an oxygen atmosphere, and the resulting films are used in a variety of applications, including electrochromic devices (e.g., smart windows), energy storage systems (like supercapacitors and batteries), catalysis (for oxidation and hydrogenation reactions), and semiconductor devices. The purity of MoO₃ sputter targets typically ranges from 99.95% to 99.999%, with higher purity levels providing better film quality and performance in sensitive applications. These targets are highly customizable in size and shape, ensuring compatibility with various deposition systems and applications.
Properties of Molybdenum Oxide
The following table provides the molybdenum oxide properties:
| Properties | Details |
| Appearance | Solid/ Circular, disc, and rectangle |
| Molar Mass | 143.94 g/mol |
| Density | 4.70 g/cm3 |
| Thermal Conductivity | 1.2 ± 0.3 W/m−1 K−1 |
| Melting Point | 802 °C (1,476 °F; 1,075 K) |
Applications
The applications of the Molybdenum Oxide (MoO₃) sputter target are listed as follows:
- MoO3 sputter targets are used to develop films for electrochromic devices, such as smart windows, that change color or transparency when an electric field is applied.
- Sputtered MoO3 films are used in photocatalytic applications for splitting water and degrading organic pollutants.
- MoO3 thin films are utilized in gas-selective membranes for various gas separation and purification processes.
- MoO₃ sputtered films are employed in thin-film transistors (TFTs) for electronics, such as flat-panel displays and flexible electronics.
- MoO₃ films are used in supercapacitors to enhance energy storage capacity and electrochemical performance.
- Sputtered MoO₃ films are used in transparent conducting films for touchscreens, solar cells, and other devices related to optoelectronic applications.
- MoO₃ films are applied as electron transport or hole-blocking layers in thin-film solar cells to increase their efficiency.
- Thin films of MoO₃, sputtered on optical devices and solar panels, ensure anti-reflective coatings that reduce the reflection of unwanted light from these devices.
FAQs
Answere: MoO₃ sputtering targets are used to deposition thin films of molybdenum trioxide (MoO₃) in applications such as electrochromic devices, photocatalysis, gas separation membranes, thin-film transistors, and energy storage devices like supercapacitors.
Answere: The pure grade of MoO₃ sputter targets generally ranges between 99.95% and 99.999%. Higher purity levels will ensure better film quality and performance, particularly in sensitive electronic and energy applications.
Answere: MoO₃ is deposited through reactive sputtering in an oxygen-rich environment. In this process, a target of MoO₃ is bombarded by ions, releasing molybdenum and oxygen atoms that deposit onto a substrate as a thin MoO₃ film.
sachin
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