| Catalogue Code | IN-AlNd-01 IN-AlNd-02 |
| Chemical Formula | NdAlO3 |
| Compound Name | Neodymium Aluminate |
| Purity (%) | >99.9 |
| Dimensions | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction
Neodymium Aluminate (NdAlO₃) sputter target is used for the deposition of thin films in advanced applications. NdAlO₃ sputter targets are known for their excellent dielectric properties, high thermal stability, and chemical inertness, making them ideal for use in electronic devices, optical coatings, and capacitors. Sputtering NdAlO₃ films allow for the creation of crystalline, insulating films that are critical in semiconductor and photonics applications. These films are often used in high-performance capacitors and luminescent materials. The purity of NdAlO₃ sputter targets typically ranges from 99.95% to 99.999%, with higher purity targets ensuring more uniform film deposition and superior material properties in sensitive applications, such as high-precision electronics and optical coatings.
Properties of Neodymium Aluminate
The table below provides the properties of Neodymium Aluminate:
| Properties | Details |
| Appearance | Solid/ circular, disc, and rectangle |
| Molar Mass | 216.87 g/mol |
| Density | 6.7-7.14 g/cm3 |
| Thermal Conductivity | 5 to 10 W/m·K |
| Melting Point | 2233 °C |
| Magnetic nature | It is paramagnetic material |
Applications
Neodymium aluminate has diverse applications depending on its properties. Some of the most important applications include the following:
- Thin films prepared from NdAlO3 sputter targets offer good dielectric performance for high-performance electronic devices.
- Optical coatings on lenses, mirrors, and other applications require sputtered NdAlO3 films for high thermal stability and optical clarity.
- Gas sensors utilize thin films of NdAlO3; gases can be detected based on their electrical conductivity and sensing properties.
- NdAlO₃ nanoparticle sputter targets help fabricate films for phosphor coatings in LEDs and other illumination technologies, where light efficiency and color rendition may improve.
- Sputtered NdAlO₃ films serve as catalyst supports for chemical processes, such as oxidation and reforming reactions.
- NdAlO₃ nanoparticle sputter targets are applied to deposit high-temperature ceramic films that withstand the toughest industrial processing conditions.
- Sputtered NdAlO₃ is used for semiconductor applications to deposit insulating or dielectric layers in devices such as capacitors and transistors.
- NdAlO₃ sputtered films are considered under magnetic applications for research in which such materials are developed for electronics and information storage.
FAQs
Answere: NdAlO₃ is sputtered in an oxygen-rich environment using a reactive sputtering process. The target is bombarded with ions in this process, releasing Nd, Al, and O atoms that deposit onto the substrate as a thin film.
Answere: Although NdAlO₃ itself is not magnetic, sputtered NdAlO₃ films are being explored for magnetic applications in research, particularly in the development of magnetic materials for electronics and data storage.
Answere: NdAlO₃ sputtered films provide insulating and dielectric layers in semiconductor devices such as capacitors, transistors, and other high-performance electronic components.
sachin
!!! Nice product