| Catalogue Code | IN-EuNi-01 IN-EuNi-02 |
| Chemical Formula | EuNiO3 |
| Compound Name | Europium Nickel Oxide |
| Purity (%) | >99.9 |
| Dimensions | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction
Europium nickel oxide sputtering targets are made up of rare earth europium, nickel, and oxide, having the chemical formula EuNiO3. These high-purity sputtering targets are essential in deposition procedures to ensure high-quality deposited films. Europium Nickel Oxide (EuNiO₃) sputtering targets have several applications, particularly in fields that rely on thin films and oxide materials with unique electronic, optical, and magnetic properties. Its composition and characteristics make it suitable for various advanced applications, particularly in electronics, sensors, and catalysis.
Properties
The table below contains all the critical properties of Europium nickel oxide:
| Properties | Description |
| Appearance and Shape | Solid, Thin film, Disc |
| Molar mass | ~ 248.62 g/mol |
| Magnetic Type | Antiferromagnetic |
| Density | ~ 7.4 g/cm³ |
| Thermal conductivity | ~ 3–4 W/m·K |
| Melting Point | ~ 1,700 °C |
Applications
Europium nickel oxide has many applications, including:
- Thin Film Deposition for Electronics: Used in the fabrication of thin films for electronic devices due to its semiconducting and conductive properties.
- Magnetic Sensors and Devices: Due to their tunable magnetic properties, these are used to create sensors, actuators, and other magnetic devices.
- Solid Oxide Fuel Cells (SOFCs): Employed in developing cathodes and anodes in SOFCs, leveraging their stability and catalytic properties.
- Optoelectronics: Suitable for applications in light-emitting diodes (LEDs) and photovoltaic cells where specific electronic properties are desired.
- Catalysis in Environmental and Energy Applications: Used in catalytic systems for energy conversion, such as in oxygen evolution reactions or fuel processing.
- Magnetoresistive Devices: Applied in spintronic devices and other technologies that depend on magnetic resistance for data storage.
FAQs
Answere: EuNiO₃ is commonly used in thin-film deposition for advanced electronic materials, oxide electronics, and research in correlated electron systems.
Answere: High-purity EuNiO₃ targets typically range from 99.9% to 99.99% purity, essential for minimizing impurities in thin-film applications.
Answere: EuNiO₃ is suitable for RF magnetron sputtering and pulsed laser deposition (PLD), enabling uniform thin-film formation.
Answere: EuNiO₃ targets should be stored in a dry, inert atmosphere to prevent moisture absorption and surface degradation.
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