Europium Titanate, EuTiO3

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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    Catalogue CodeIN-EuTi-01 IN-EuTi-02
    CAS No.12020-61-0
    Chemical FormulaEuTiO3
    Compound NameEuropium Titanate
    Purity (%)>99.9
    DimensionsDia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”

    Introduction

    Europium titanate sputtering targets are made up of rare earth europium, titanium, and oxide, having the chemical formula EuTiO3 or ETO. Europium Titanate is a fascinating material; it shows magnetoelectric coupling, multiferroicity, and quantum paraelectric behavior. These characteristics give EuTiO₃ a variety of potential applications across advanced technological fields. These specific properties make EuTiO₃ particularly useful in producing thin films and devices via sputtering techniques.

    Properties

    The table below contains all the critical properties of Europium titanate : 

    PropertiesDescription
    Appearance and ShapeSolid, Thin film, Disc 
    Molar mass~ 348.91 g/mol
    Magnetic TypeAntiferromagnetic (at low temperatures)
    Density~5.2 g/cm³
    Thermal conductivity ~ 3–5 W/m·K 
    Melting Point~1,850 °C

    Applications

    Europium titanate  has many applications, including:

    • Thin Film Deposition: Used to fabricate ferroelectric and dielectric thin films for microelectronics.
    • Magnetic Devices: Employed in magnetic sensors and memory devices due to their magnetoresistive properties.
    • Electro-optic Applications: Exploited in devices requiring specific optical and electrical properties, such as tunable capacitors.
    • Non-Volatile Memories: Its ferroelectric characteristics make it a candidate for future memory technologies.

    High-Frequency Devices: Used in advanced RF (radio frequency) components due to their unique dielectric properties.

    FAQs

    Queston: What are the critical properties of EuTiO₃ that make it suitable for sputtering?

    Answere: EuTiO₃ is valued for its unique combination of magnetoelectric coupling, multiferroicity, and quantum paraelectric behavior. These properties make it an excellent candidate for creating thin films in advanced electronic and spintronic devices.

    Queston: What are the primary applications of EuTiO₃ thin films produced by sputtering?

    Answere: Although EuTiO₃ nanoparticle thin films are relatively new, they are currently used in many fields, including spintronics, magnetoelectric sensors, and multiferroic devices. Due to their electric, magnetic, and optical characteristics, they are helpful in the cutting-edge domains of contemporary technology, including memory storage, energy harvesting, and optoelectronics.

    Queston: What deposition conditions are required for sputtering EuTiO₃?

    Answere: Optimal deposition conditions for sputtering EuTiO₃ include precise control over substrate temperature, sputtering power, and oxygen partial pressure. Substrate temperatures usually range from 300°C to 600°C, and maintaining the correct oxygen atmosphere is essential to avoid oxygen vacancies, which can affect the material's properties.

    Queston: Can EuTiO₃ sputtering targets be used in co-sputtering or combinatorial sputtering?

    Answere: EuTiO₃ nanoparticle sputtering targets can be used in co-sputtering or combinatorial techniques to create complex oxide heterostructures or composite materials.

    1 review for Europium Titanate, EuTiO3

    1. sachin

      Effective Product

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