Indium Zinc Oxide, IZO
Indium zinc oxide (IZO) sputtering targets as a high-performance transparent conducting oxide for next-generation displays, flexible electronics, and thin-film photovoltaics. Formulated as a 90/10 wt% In2O3-ZnO ceramic, our IZO targets deposit smooth, amorphous, low-resistivity films that outperform conventional ITO on temperature-sensitive and flexible substrates. Available in standard and custom diameters at purities from 99.9% to 99.99%, each target is manufactured for consistent density and low particulate generation during RF and DC magnetron sputtering.
| Purity (%) : | >99.9 |
| Dimensions : | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction to Indium Zinc Oxide
Indium zinc oxide (IZO) is a transparent conducting oxide typically composed of In₂O₃ and ZnO, commonly around a 90:10 weight ratio. Zinc incorporation promotes an amorphous or nanocrystalline structure, providing high optical transparency, low surface roughness, and good electrical conductivity. As a sputtering target, IZO enables smooth, uniform films at relatively low substrate temperatures, making it suitable for heat-sensitive substrates. Magnetron-sputtered IZO films are widely used as transparent electrodes and conductive layers in displays, oxide thin-film transistors, flexible touch sensors, thin-film photovoltaics, and low-emissivity glass. Its combination of transparency, conductivity, and low-temperature processability makes IZO attractive for advanced flexible electronics.
FAQs
Question: 1) How is Indium Zinc Oxide used as a sputtering target?
Answer: Indium Zinc Oxide (IZO) sputtering targets are materials composed of indium oxide and zinc oxide used in thin-film deposition processes. They primarily create transparent conductive films for applications like touch screens, solar cells, and OLED displays.
Introduction to Indium Zinc Oxide
Indium zinc oxide (IZO) is a transparent conducting oxide typically composed of In₂O₃ and ZnO, commonly around a 90:10 weight ratio. Zinc incorporation promotes an amorphous or nanocrystalline structure, providing high optical transparency, low surface roughness, and good electrical conductivity. As a sputtering target, IZO enables smooth, uniform films at relatively low substrate temperatures, making it suitable for heat-sensitive substrates. Magnetron-sputtered IZO films are widely used as transparent electrodes and conductive layers in displays, oxide thin-film transistors, flexible touch sensors, thin-film photovoltaics, and low-emissivity glass. Its combination of transparency, conductivity, and low-temperature processability makes IZO attractive for advanced flexible electronics.
Key Properties of Indium Zinc Oxide
| Property | Value | Significance |
|---|
| Chemical composition | In2O3-ZnO, 90/10 wt% (standard) | Sets carrier concentration, resistivity, and amorphous stability of sputtered films |
| CAS number | 117944-65-7 | Uniquely identifies the material for procurement, customs, and safety documentation |
| Purity | 99.9% – 99.99% | Controls film conductivity and limits contamination in sensitive electronic and optical devices |
| Density (bulk ceramic) | ~6.0-7.1 g/cm3 | Affects sputtering rate, deposition uniformity, and achievable target lifetime |
| Melting point | ~1,900-1,920 C | Governs sintering conditions and thermal stability of the target under high-power sputtering |
| Molar mass | Not applicable (mixed-oxide composite) | Composition is specified by In2O3:ZnO weight ratio rather than a single molecular formula. |
| Crystal structure (as-deposited film) | Amorphous | Enables smooth, low-roughness films suited to flexible substrates and TFT channels |
| Electrical resistivity (thin film) | ~10^-4 ohm-cm | Comparable to ITO, supporting use as a transparent electrode in displays and photovoltaics |
Types & Grades of Indium Zinc Oxide
Indium Zinc Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| Standard 90/10 wt% IZO | 99.9% | Most common ratio; balances conductivity, transparency, and etchability for display electrodes |
| High-purity 4N/5N grade | 99.99% – 99.999% | Reduced trace-metal content for OLED and flexible TFT backplanes where defect density is critical |
| 95/5 wt% high-indium grade | 99.9% | Higher carrier mobility variant used in research and speciality photovoltaic coatings |
| 60/40 wt% zinc-rich grade | 99.9% | Increased etch selectivity and reduced indium content for cost-sensitive or ITO-alternative applications |
| Rotary or bonded target form | 99.9% – 99.99% | Bonded to a backing plate or fabricated as a rotary cylinder for high-throughput, large-area in-line sputtering |
Applications of Indium Zinc Oxide
Sputtered films of Indium Zinc Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Flat-panel display | Transparent pixel electrodes in LCD/OLED backplanes | Provides high optical transmittance with stable amorphous conductivity across large-area substrates |
| Flexible electronics | Transparent conductors on plastic and polymer substrates | Amorphous film deposits smoothly at low temperature without cracking under bending |
| Thin-film transistors (TFT) | Channel and electrode layers in oxide TFTs | Amorphous microstructure yields uniform threshold voltage and high electron mobility |
| Photovoltaics | Transparent conducting layer in thin-film solar cells | Passes sunlight while collecting generated current with low series resistance |
| Touchscreens | Transparent electrode grid in capacitive touch sensors | Smooth amorphous surface reduces visible haze and improves patterning resolution |
| Architectural and automotive glazing | Low-emissivity and anti-static transparent coatings | Combines infrared reflectivity with electrical conductivity in multilayer coating stacks |
Why Partner with Infinita Materials?
- Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
- Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
- Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Indium Zinc Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Frequently Asked Questions
1) How is Indium Zinc Oxide used as a sputtering target?
Indium Zinc Oxide (IZO) sputtering targets are materials composed of indium oxide and zinc oxide used in thin-film deposition processes. They primarily create transparent conductive films for applications like touch screens, solar cells, and OLED displays.
Can IZO be used in solar cells?
This grade has good transport properties, making it suitable for thin-film solar cells as an electron transport layer, enhancing their efficiency.
Indium Zinc Oxide, IZO
Used in Various Industries
Biomedical
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