Iron Oxide, Fe2O3
Iron oxide (Fe2O3) sputtering targets from Infinita Materials deliver a dense, high-purity ceramic source for depositing hematite and related iron oxide thin films used in gas sensors, photoelectrochemical devices, magnetic layers, and protective coatings. Each target is fabricated to controlled stoichiometry and grain structure to support stable, reproducible RF and DC magnetron sputtering runs. Standard 1 in and 2 in disc formats are stocked, with custom diameters, thicknesses, and bonded assemblies produced to specification.
| Purity (%) : | >99.9 |
| Dimensions : | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction to Iron Oxide
Iron(III) oxide (Fe₂O₃) is most commonly found as hematite, a stable corundum-structured oxide with antiferromagnetic behaviour and a visible-light bandgap of approximately 2.0–2.2 eV. Depending on sputtering conditions, Fe₂O₃ can also form maghemite or transform toward other iron-oxide phases, enabling tuning of magnetic and electronic properties. As a sputtering target, Fe₂O₃ provides dense, compositionally controlled films with uniform thickness and reproducible microstructure. RF magnetron sputtering is used for gas sensors, photoanodes for solar water splitting, antiferromagnetic exchange-bias layers, magnetic devices, and functional glass coatings. Its abundance, low cost, and relatively low toxicity further support scalable applications.
FAQs
Introduction to Iron Oxide
Iron(III) oxide (Fe₂O₃) is most commonly found as hematite, a stable corundum-structured oxide with antiferromagnetic behaviour and a visible-light bandgap of approximately 2.0–2.2 eV. Depending on sputtering conditions, Fe₂O₃ can also form maghemite or transform toward other iron-oxide phases, enabling tuning of magnetic and electronic properties. As a sputtering target, Fe₂O₃ provides dense, compositionally controlled films with uniform thickness and reproducible microstructure. RF magnetron sputtering is used for gas sensors, photoanodes for solar water splitting, antiferromagnetic exchange-bias layers, magnetic devices, and functional glass coatings. Its abundance, low cost, and relatively low toxicity further support scalable applications.
Key Properties of Iron Oxide
| Property | Value | Significance |
|---|
| Chemical formula | Fe2O3 | defines the 2:3 iron-to-oxygen stoichiometry targeted during sputtering and reactive deposition |
| CAS number | 1309-37-1 | uniquely identifies iron(III) oxide for procurement, safety documentation, and regulatory compliance |
| Molar mass | ~159.69 g/mol | used to calculate deposition rates and target consumption during sputtering runs |
| Density | ~5.24 g/cm3 | governs sputter yield, target mass for a given geometry, and film thickness calculations |
| Melting point | ~1565-1566 C | sets the upper thermal limit for target handling and indicates high thermal stability under plasma bombardment |
| Crystal structure | corundum-type rhombohedral (hematite, alpha-Fe2O3) | determines the antiferromagnetic ordering and optical absorption behaviour transferred to sputtered films |
| Band gap | ~2.0-2.2 eV | enables visible-light absorption exploited in photocatalytic and photoelectrochemical applications |
| Magnetic behavior | antiferromagnetic (alpha-phase); weakly ferromagnetic (gamma-maghemite) | makes iron oxide films useful as exchange-bias and magnetic sensor layers |
Types & Grades of Iron Oxide
Iron Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| Standard industrial grade | 99.9% (3N) | general-purpose thin-film deposition, functional and protective coatings, cost-sensitive production runs |
| High-purity electronic grade | 99.99% (4N) | gas-sensing layers, photoelectrochemical photoanodes, and semiconductor device research requiring lower defect density |
| Ultra-high-purity research grade | 99.999% (5N) | spintronic and magnetic thin-film studies where trace impurities affect magnetic ordering |
| Indium-bonded target assembly | 99.9% and above | pre-bonded to a copper or aluminium backing plate for direct installation in magnetron sputtering systems |
| Custom planar and rotary target | 99.9-99.99% | large-area or in-line deposition for architectural glass coating and display manufacturing lines |
Applications of Iron Oxide
Sputtered films of Iron Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Gas sensing | chemiresistive metal-oxide gas sensors | Fe2O3 thin film resistance shifts on exposure to reducing or oxidising gases, enabling detection |
| Solar energy and photocatalysis | photoelectrochemical water-splitting photoanodes | n-type semiconducting film absorbs visible light and drives photocatalytic redox reactions |
| Magnetic recording and spintronics | exchange-bias and antiferromagnetic pinning layers | hematite film pins the magnetisation of an adjacent ferromagnetic layer in spin-valve and MTJ stacks |
| Architectural and automotive glass | solar-control and low-emissivity coatings | iron oxide layer tunes colour and infrared absorption in coated glass assemblies |
| Corrosion protection | protective barrier coatings on metal substrates | dense, chemically stable oxide film resists moisture and oxidative attack |
| Energy storage research | thin-film lithium-ion battery anode layers | Fe2O3 conversion-type anode films are evaluated for capacity and cycling behaviour in miniaturised cells. |
Why Partner with Infinita Materials?
- Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
- Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
- Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Iron Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Frequently Asked Questions
Iron Oxide, Fe2O3
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