| Catalogue Code | IN-CuLaMn-01 IN-CuLaMn-02 |
| Chemical Formula | La2CuMnO6 |
| Compound Name | Lanthanum Copper Manganate |
| Purity (%) | >99.9 |
| Dimensions | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction
Lanthanum Copper Manganate (La₂CuMnO₆) is a multifunctional perovskite material with significant applications in advanced material science. Its double-perovskite structure provides tunable physical and electronic properties, making it a highly versatile sputtering target for thin-film deposition. These are used in high-purity form in deposition processes and can significantly contribute to film qualities deposited through sputtering targets. The lanthanum copper manganate sputtering target is used for thin film deposition, decoration, semiconductor, functional coating, and other optical information storage space industries.
Properties
The table below contains all the critical properties of Lanthanum Copper Manganate (La2CuMnO6):
| Properties | Description |
| Appearance and Shape | Solid, Thin film, Disc |
| Molar mass | ~467.84 g/mol |
| Magnetic Type | Ferromagnetic |
| Density | ~ 6.5 g/cm³ |
| Thermal conductivity | approx. ~2–3 W/m·K |
Application
Lanthanum, copper, and manganese have many applications, including in:
- Magnetoelectric and Multiferroic Materials: Used in devices that require coupling between magnetic and electric orders, such as sensors, memory devices, and spintronics.
- Catalysis: La₂CuMnO₆ is effective in catalytic oxidation reactions, particularly in automotive exhaust treatment and other pollution control systems.
- Thermoelectric Materials: Its thermal stability and electrical conductivity make it worthwhile for waste heat recovery in thermoelectric devices.
- Magnetic Refrigeration: The magnetocaloric effect makes La₂CuMnO₆ suitable for magnetic refrigeration, an energy-efficient cooling technology.
- Electrochemical Devices: Solid oxide fuel cells (SOFCs) and supercapacitors use these materials for their excellent ionic and electronic conduction properties.
FAQs
Answere: La₂CuMnO₆ targets are commonly used for fabricating thin films in research on multiferroic materials, spintronics, and magnetoresistive devices.
Answere: Optimal conditions depend on the deposition system, but they generally involve RF or DC sputtering with an oxygen/argon gas mixture and substrate temperatures between 600 - 800°C.
Answere: A purity level of 99.9% or higher is recommended to minimize impurities affecting the functional properties of the deposited films.
Answere: Due to their ceramic nature, these targets are brittle, so careful handling is necessary to avoid cracking. Fine-tuning deposition parameters is also critical to maintaining stoichiometry in thin films.
Answere: While primarily used in research, they can be scaled up for production with precise optimization of sputtering systems and robust quality control for uniformity.
sachin
Nice product !!!