Lanthanum Copper Manganate (La2CuMnO6) sputtering targets from Infinita Materials deliver an ordered double-perovskite oxide in which copper and manganese occupy distinct B-site positions in a 1:1 ratio, rather than the disordered arrangement found in simple copper-doped LaMnO3 solid solutions. This B-site cation ordering underpins the material’s mixed Cu2+/Mn4+ valence and associated magnetic exchange behaviour, making it a useful source material for oxide-electronics and spintronic thin-film research. Supplied in standard 1 in and 2 in disc formats or custom configurations, each target is manufactured to consistent stoichiometry and grain density for reliable RF and magnetron sputtering performance.
Lanthanum Copper Manganate La2CuMnO6 is a monoclinic double-perovskite oxide in which Cu and Mn occupy ordered B-sites within a La-O framework. The ordered Cu2+/Mn4+ sublattice produces super-exchange interactions and magnetic behaviour, while Jahn-Teller-active Cu2+ contributes to local structural distortion. As a sputtering target, La2CuMnO6 enables direct transfer of its controlled Cu-Mn ordering and La:Cu:Mn:O stoichiometry into thin films. RF magnetron sputtering is used to produce uniform polycrystalline or epitaxial layers for spintronics, magnetoresistive sensors, double-perovskite heterostructures, and magnetic oxide research, where precise cation ordering and composition are essential for reproducible electronic and magnetic properties.
Answer: La₂CuMnO₆ targets are commonly used for fabricating thin films in research on multiferroic materials, spintronics, and magnetoresistive devices.
Answer: Optimal conditions depend on the deposition system, but they generally involve RF or DC sputtering with an oxygen/argon gas mixture and substrate temperatures between 600 - 800°C.
Answer: Due to their ceramic nature, these targets are brittle, so careful handling is necessary to avoid cracking. Fine-tuning deposition parameters is also critical to maintaining stoichiometry in thin films.
Answer: While primarily used in research, they can be scaled up for production with precise optimization of sputtering systems and robust quality control for uniformity.
Lanthanum Copper Manganate La2CuMnO6 is a monoclinic double-perovskite oxide in which Cu and Mn occupy ordered B-sites within a La-O framework. The ordered Cu2+/Mn4+ sublattice produces super-exchange interactions and magnetic behaviour, while Jahn-Teller-active Cu2+ contributes to local structural distortion. As a sputtering target, La2CuMnO6 enables direct transfer of its controlled Cu-Mn ordering and La:Cu:Mn:O stoichiometry into thin films. RF magnetron sputtering is used to produce uniform polycrystalline or epitaxial layers for spintronics, magnetoresistive sensors, double-perovskite heterostructures, and magnetic oxide research, where precise cation ordering and composition are essential for reproducible electronic and magnetic properties.
Key Properties of Lanthanum Copper Manganate
Property
Value
Significance
Chemical formula
La2CuMnO6
Confirms an ordered Cu/Mn double-perovskite stoichiometry distinct from simple Cu-doped LaMnO3
CAS number
Not established
No unique CAS registry number is currently assigned to this double-perovskite composition by major chemical or supplier references
Molar mass
~492.29 g/mol
Basis for calculating stoichiometric mass transfer from target to deposited film
Density (theoretical)
~6.5 g/cm3
Determines target mass for a given geometry and informs achievable sputter yield
Crystal structure
Monoclinic, ordered A2BB’O6 double perovskite
B-site Cu/Mn cation ordering governs magnetic exchange pathways and Jahn-Teller distortion
Magnetic behaviour
Ferromagnetic/mixed Cu-Mn exchange coupling
Supports use in magneto-resistive and spintronic thin-film research
Thermal conductivity
~2-3 W/m*K
Low value requires conservative power ramping and often bonding to prevent thermal-shock cracking.
Physical form
Solid ceramic disc, bonded plate, or thin film
Standard geometries compatible with planar magnetron and RF sputtering systems
Types & Grades of Lanthanum Copper Manganate
Lanthanum Copper Manganate targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
Grade / Form
Typical Purity
Key Features / Uses
Standard ceramic, 2N-3N
99% – 99.9%
General-purpose R&D deposition and process development where cost sensitivity outweighs trace-purity requirements
High-purity ceramic, 3N
99.9%
Infinita Materials standard catalogue grade (IN-CuLaMn-01, IN-CuLaMn-02), balancing cost and film performance for routine RF/magnetron sputtering
Ultra-high-purity ceramic, 4N
99.99%
Reduced trace-metal content for spintronic multilayers and magneto resistive stacks sensitive to contamination
Research-grade, 5N
99.999%, custom on request
Reserved for fundamental double-perovskite exchange-coupling and Jahn-Teller studies requiring minimal defect and impurity states
Bonded target (In or elastomer)
99.9% – 99.99% typical
Ceramic disc bonded to a backing plate to compensate for low thermal conductivity and brittleness during high-power sputtering.
Applications of Lanthanum Copper Manganate
Sputtered films of Lanthanum Copper Manganate support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
Industry
Application
Function
Spintronics and magnetic devices
Magnetic tunnel junction and multiferroic thin-film stacks
Provides a ferromagnetic, mixed-valence Mn-Cu oxide layer contributing to magnetoresistive behaviour
Semiconductor and thin-film electronics
Perovskite oxide heterostructure growth
Serves as a functional double-perovskite layer alongside related manganite and cuprate superlattices
Sensor technology
Magnetoresistive and thermistor-type sensor films
Exploits the magnetic and electronic transition behaviour of the B-site ordered perovskite lattice
Academic and materials research
Study of double-perovskite exchange coupling and Jahn-Teller effects
Enables controlled, phase-pure thin-film samples for structural and magnetic characterisation
Energy materials research
Solid oxide fuel cell cathode and interconnect film studies
Mixed Mn/Cu valence supports investigation of oxygen-ion and electronic transport in oxide films
Advanced ceramics and functional coatings
Protective or functional oxide thin-film coatings
Deposits stable, double-perovskite oxide films with tunable magnetic and electronic properties
Why Partner with Infinita Materials?
Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Lanthanum Copper Manganate sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Other Related Product to Lanthanum Copper Manganate, La2CuMnO6
Optimal conditions depend on the deposition system, but they generally involve RF or DC sputtering with an oxygen/argon gas mixture and substrate temperatures between 600 - 800°C.
Due to their ceramic nature, these targets are brittle, so careful handling is necessary to avoid cracking. Fine-tuning deposition parameters is also critical to maintaining stoichiometry in thin films.
While primarily used in research, they can be scaled up for production with precise optimization of sputtering systems and robust quality control for uniformity.
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