Lanthanum Copper Oxide (La2CuO4) sputtering targets for researchers and thin-film manufacturers working at the frontier of high-temperature superconductivity and correlated-electron physics. As the antiferromagnetic parent compound from which hole-doped cuprate superconductors such as lanthanum strontium copper oxide and lanthanum barium copper oxide are derived, La2CuO4 anchors both fundamental studies of the Mott-insulator-to-superconductor transition and applied work in complex oxide electronics. Each target is produced to controlled stoichiometry and microstructure to support reproducible epitaxial and polycrystalline film growth. Standard and custom-bonded formats ship ready for immediate deposition use.
Lanthanum Copper Oxide La2CuO4 crystallises in a layered K2NiF4-type structure, with corner-sharing CuO6 octahedra forming two-dimensional CuO2 planes separated by La-O layers. It is an antiferromagnetic Mott insulator with Cu2+ spins ordering below approximately 325–340 K and serves as the parent compound for superconducting cuprates such as La2-xSrxCuO4. As La2CuO4 decomposes rather than melting congruently, RF magnetron sputtering from a dense ceramic target provides controlled, stoichiometric thin films. These films are used as reference layers, buffer and template layers in cuprate heterostructures, and antiferromagnetic layers in spintronic and oxide-electronics research.
Answer: Typical conditions include a substrate temperature of 600-800°C, oxygen/argon gas mixtures, and 5-20 mTorr pressures. These may vary based on film requirements.
Answer: Handle targets with care to avoid chipping. Store them properly in a dry, clean environment to prevent contamination and maintain sputtering performance.
Lanthanum Copper Oxide La2CuO4 crystallises in a layered K2NiF4-type structure, with corner-sharing CuO6 octahedra forming two-dimensional CuO2 planes separated by La-O layers. It is an antiferromagnetic Mott insulator with Cu2+ spins ordering below approximately 325–340 K and serves as the parent compound for superconducting cuprates such as La2-xSrxCuO4. As La2CuO4 decomposes rather than melting congruently, RF magnetron sputtering from a dense ceramic target provides controlled, stoichiometric thin films. These films are used as reference layers, buffer and template layers in cuprate heterostructures, and antiferromagnetic layers in spintronic and oxide-electronics research.
Key Properties of Lanthanum Copper Oxide
Property
Value
Significance
Chemical formula
La2CuO4
defines the 2:1:4 La:Cu:O stoichiometry underlying the K2NiF4-type cuprate lattice
Crystal structure
Orthorhombic (Cmce) at room temperature; tetragonal (I4/mmm) above ~530 K
Governs the octahedral tilting that competes with superconducting order in doped derivatives
Molar mass
~405.35 g/mol
used for target mass accounting, deposition rate calibration and stoichiometry checks
Density (theoretical)
~6.93 – 7.08 g/cm3
informs expected sputtering yield and target lifetime estimates
Electronic ground state
Antiferromagnetic Mott insulator, Neel temperature ~325-340 K
the undoped reference state from which superconductivity emerges upon hole doping
Thermal behavior
Decomposes rather than melting congruently at high temperature
rules out conventional melt growth and makes sputtering the practical route to thin-film coverage
Doping response
Sr or Ba substitution for La (La2-xMxCuO4) induces superconductivity up to Tc ~38-40 K
Positions the undoped target as the base composition for combinatorial doped-film libraries
CuO2 plane structure
Layered perovskite-derived lattice with corner-sharing CuO6 octahedra forming CuO2 planes
The structural motif shared by essentially all cuprate high-temperature superconductors
Types & Grades of Lanthanum Copper Oxide
Lanthanum Copper Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
Grade / Form
Typical Purity
Key Features / Uses
Standard research-grade disc
99.9%
1-2 in diameter discs for general-purpose PVD of undoped La2CuO4 reference films
High-purity grade
99.99%
Reduced transition-metal and rare-earth cross-contamination for magnetotransport and neutron scattering studies
Ultra-high-purity grade
99.999%
Used where trace paramagnetic impurities would obscure intrinsic Mott-insulator behaviour
Bonded target (indium or elastomer)
99.9% – 99.99%
bonded to a copper backing plate for improved heat dissipation during extended RF sputtering runs
Custom stoichiometry / pre-doped blend
Custom, 99.5% and up
tailored La: Cu ratio or pre-doped (Sr, Ba) target blend for combinatorial deposition studies
Applications of Lanthanum Copper Oxide
Sputtered films of Lanthanum Copper Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
Industry
Application
Function
High-Tc superconductivity research
Parent-phase thin-film growth for LSCO/LBCO device studies
Provides the undoped antiferromagnetic reference layer against which doped superconducting films are benchmarked
Quantum materials / condensed matter physics
Epitaxial cuprate heterostructure fabrication
enables study of interfacial magnetism, strain-tuned phase transitions and Mott physics in device geometries
Complex oxide electronics R&D
Buffer and seed layers beneath functional oxide heterostructures
Supplies a lattice-matched perovskite-derived template for subsequent oxide layers
Spintronics research
Antiferromagnetic thin-film layers for spin-transport studies
exploits the intrinsic Neel order of La2CuO4 for antiferromagnetic-spintronic device concepts
Academic & national-lab thin-film deposition
RF magnetron sputtering targets for teaching and exploratory PVD labs
Delivers a stable, well-characterised ceramic target compatible with standard sputtering systems
Superconducting electronics manufacturing
Multilayer HTS device stack fabrication
serves as an insulating or antiferromagnetic separator layer within layered cuprate device architectures
Why Partner with Infinita Materials?
Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Lanthanum Copper Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Other Related Product to Lanthanum Copper Oxide, La2CuO4
Typical conditions include a substrate temperature of 600-800°C, oxygen/argon gas mixtures, and 5-20 mTorr pressures. These may vary based on film requirements.
Handle targets with care to avoid chipping. Store them properly in a dry, clean environment to prevent contamination and maintain sputtering performance.
Yes, annealing in an oxygen atmosphere is often performed to enhance crystallinity and optimize superconducting or electronic properties.
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