Lanthanum Oxide, La2O3
Lanthanum oxide (La2O3) sputtering targets from Infinita Materials deliver high-purity, stoichiometric source material for depositing dense, uniform thin films by RF magnetron and reactive sputtering. Valued as a high-k gate dielectric candidate and as an index-enhancing additive in optical coatings, La2O3 combines a wide bandgap with excellent chemical and thermal stability. Each target is manufactured to controlled density and grain structure to support stable, low-particulate deposition. Supplied by Infinita Materials in standard and custom formats for research and production environments.
| Purity (%) : | >99.9 |
| Dimensions : | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction to Lanthanum Oxide
Lanthanum oxide (La2O3 is a rare-earth sesquioxide that crystallises in a hexagonal A-type structure at room temperature and transforms to a cubic polymorph at elevated temperatures. It is a wide-bandgap insulating oxide with a high dielectric constant, high melting point, and strong La–O bonding, making it attractive for advanced dielectric and optical applications. However, its hygroscopic nature requires controlled storage and handling. As a sputtering target, La2O3 enables high-density, stoichiometric thin-film deposition without the oxidation-state control challenges of metallic lanthanum. Sputtered films are used in CMOS gate dielectrics, optical coatings, phosphor hosts, solid-oxide fuel cells, and battery-related functional layers.
FAQs
Introduction to Lanthanum Oxide
Lanthanum oxide (La2O3 is a rare-earth sesquioxide that crystallises in a hexagonal A-type structure at room temperature and transforms to a cubic polymorph at elevated temperatures. It is a wide-bandgap insulating oxide with a high dielectric constant, high melting point, and strong La–O bonding, making it attractive for advanced dielectric and optical applications. However, its hygroscopic nature requires controlled storage and handling. As a sputtering target, La2O3 enables high-density, stoichiometric thin-film deposition without the oxidation-state control challenges of metallic lanthanum. Sputtered films are used in CMOS gate dielectrics, optical coatings, phosphor hosts, solid-oxide fuel cells, and battery-related functional layers.
Key Properties of Lanthanum Oxide
| Property | Value | Significance |
|---|
| Chemical formula | La2O3 | Defines the fixed 2:3 lanthanum-to-oxygen stoichiometry the target must reproduce in the deposited film |
| CAS number | 1312-81-8 | Unique substance identifier used for procurement, safety documentation, and regulatory compliance |
| Molar mass | ~325.81 g/mol | Used to convert sputter yield and deposition rate data into film growth-rate calculations |
| Density (theoretical) | ~6.51 g/cm3 | Baseline for calculating target mass, expected lifetime, and achievable film packing density |
| Melting point | ~2,315 C | High thermal stability reduces target softening or decomposition under sustained ion bombardment. |
| Crystal structure | Hexagonal A-type (low T); cubic C-type (high T) | Affects grain orientation, sputter yield anisotropy, and resulting film crystallinity |
| Bandgap | ~5.5 – 6.0 eV | Wide bandgap underlies use as an insulating high-k dielectric and optically transparent coating |
| Dielectric constant (k) | ~27 (bulk) | Primary property driving interest in La2O3 as a high-k CMOS gate dielectric replacement for SiO2. |
Types & Grades of Lanthanum Oxide
Lanthanum Oxide targets are offered in standard catalogue sizes and grades, with custom purity, density, and geometry available for OEM and R&D deposition systems.
| Grade / Form | Typical Purity | Key Features / Uses |
|---|
| 2N (99%) | 99% | Cost-effective grade for non-critical decorative and general optical thin films |
| 3N (99.9%) | 99.9% | Standard industrial grade for optical coatings, index-enhancement layers, and general PVD work |
| 4N (99.99%) | 99.99% | High-k dielectric research, semiconductor process development, and phosphor host films |
| 5N (99.999%) | 99.999% | Advanced microelectronics and low-defect-density films where trace impurities affect device performance |
| Indium-bonded target | 99.9% – 99.99% | Bonded to a copper backing plate to manage the low thermal conductivity and brittleness of the La2O3 ceramic |
Applications of Lanthanum Oxide
Sputtered films of Lanthanum Oxide support demanding roles across research and production applications where this material’s specific structural, electronic, or optical properties are the key requirement.
| Industry | Application | Function |
|---|
| Semiconductor | High-k gate dielectric layers | Replaces silicon dioxide in transistor gate stacks to reduce gate leakage current at scaled dimensions |
| Optics | Anti-reflective and index-matching coatings | Raises refractive index of coating stacks to improve lens and lens-assembly optical performance |
| Glass and speciality glass | Optical glass surface coatings | Improves refractive index and reduces dispersion in camera, telescope, and precision optical elements |
| Energy storage | Solid oxide fuel cell and battery thin films | Functions as an interfacial or electrolyte-related layer supporting ionic transport and stability |
| Display and photonics | Phosphor and luminescent thin films | Serves as a host or sensitising layer in thin-film phosphor and luminescent device stacks |
| Aerospace and protective coatings | Thermal and corrosion-resistant coatings | Provides a chemically stable, high-melting-point barrier layer on components exposed to heat and corrosive environments |
Why Partner with Infinita Materials?
- Technical Depth: in-house quality control with ICP-MS and XRF purity verification, density measurement, and full certificates of analysis on every target.
- Global Logistics: reliable supply from single R&D-scale targets to production-line volumes, with established international shipping.
- Responsive Support: direct access to materials engineers for grade, bonding, and geometry selection, and process-compatibility questions.
Take the Next Step
Infinita Materials fabricates Lanthanum Oxide sputtering targets engineered to the purity, density, and geometry your deposition process requires. Whether the requirement is a standard catalogue target or a custom size, purity, or bonded assembly, our team can help match the right specification to your deposition system. Request a quote or speak with our technical team to discuss your target specification.
Frequently Asked Questions
Lanthanum Oxide, La2O3
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