| Catalogue Code | IN-La-01 IN-La-02 |
| CAS No. | 1312-81-8 |
| Chemical Formula | La2O3 |
| Compound Name | Lanthanum Oxide |
| Purity (%) | >99.9 |
| Dimensions | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction
Lanthanum Oxide (La₂O₃) is a highly stable, white, crystalline compound derived from lanthanum, a rare-earth element. Due to its unique properties, such as high thermal stability, excellent resistance to oxidation, and wide optical transparency range, La₂O₃ is widely used in various applications, including as a sputtering target in thin-film deposition processes. In sputtering, La₂O₃ is commonly employed for producing thin films of lanthanum-based oxide materials, essential in various electronic and optical applications.
Properties
The table below contains all the critical properties of Lanthanum oxide:
| Properties | Description |
| Appearance | White powder |
| Molar mass | ~ 325.81 g/mol |
| Density | ~ 6.51 g/cm³ |
| Thermal conductivity | ~ 1.7 W/m·K |
| Melting Point | ~ 2,480 °C |
Applications
The following are some of the applications of Lanthanum oxide:
- Fabrication of Lanthanum-based Thin Films: Used in producing thin films for semiconductors, sensors, and optical coatings.Optical Glass: Enhances refractive index and durability in camera lenses, optical instruments, and specialized glasses.
- Optical Coatings: Sputtered films of La₂O₃ are utilized in optical coatings, improving the durability and efficiency of lenses and mirrors.
- Phosphor Materials: Employed in phosphors for color television tubes, LEDs, and lighting applications.
- Battery Materials: Used in nickel-metal hydride (NiMH) batteries to enhance performance and efficiency.
- Superconductors and Sensors: Lanthanum oxide thin films are integral in fabricating high-temperature superconductors and gas sensors.
- Aerospace Applications: La₂O₃ sputtering targets are used for coatings in harsh environments, including aerospace components, due to their resistance to oxidation and high temperatures.
FAQs
Answere: Lanthanum oxide is commonly used as a sputtering target for the deposition of thin films in electronics and optical coatings and as a dielectric material in capacitors.
Answere: La₂O₃ has high thermal stability, good electrical insulation properties, and the ability to form thin, high-quality oxide films, making it ideal for sputtering in high-performance applications.
Answere: La₂O₃ targets are often used on substrates such as silicon, glass, and sapphire for thin-film deposition, particularly in the semiconductor and optical industries.
Answere: La₂O₃ sputtering targets are manufactured to high purity levels (typically 99.99% or higher) to ensure consistent and high-quality film deposition with minimal impurities.
Answere: La₂O₃ offers superior dielectric properties, high refractive index, and resistance to radiation, making it ideal for applications requiring high stability and performance, such as in optical and semiconductor coatings.
sachin
Nice product !!!