Introduction to Zinc Oxide Alumina
Zinc oxide alumina is engineered to meet the demanding requirements of cutting-edge application environments. By doping zinc oxide with precise amounts of alumina, manufacturers can control electrical resistivity, transparency, and durability — all key attributes for products in semiconductor, energy, and display markets. Whether utilized as a sputtering target for thin-film deposition or as a powder for composites and electronics, zinc oxide alumina (AZO) stands as a versatile and technically advanced material for researchers and industrial process engineers seeking reliable, customizable, and high-purity solutions.
FAQs
Answere: Infinita Materials supplies AZO with typical purity of ≥99.9%, suitable for demanding semiconductor and optoelectronic applications.
Answere: Infinita Materials provides custom compositions, backing plate options, and grain sizes, ensuring compatibility with RF, DC, or magnetron sputtering as well as solution processing.
Answere: ZnO/Al₂O₃ targets are most commonly used in reactive sputtering processes, particularly when a transparent conductive film or semiconductor layer is required.
Answere: Standard products are available with minimum orders of 100g for nanopowders and 1kg for ceramic grades, with typical delivery times of 1-2 weeks for stock items. Sputtering targets require 3-4 weeks production time with minimum quantities based on target size and specification.
Answere: Yes, we manufacture high-density Zinc Oxide Alumina sputtering targets in various sizes and compositions for DC and RF sputtering applications.
sachin
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