Indium Iron Oxide, InFe2O4

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
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    Catalogue CodeIN-InFe-01 IN-InFe-02
    CAS No.1312-43-2
    Chemical FormulaInFe2O4
    Compound NameIndium Iron Oxide
    Purity (%)>99.9
    DimensionsDia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”

    Introduction

    Indium Iron Oxide (InFe₂O₄) sputter target is a high-purity material for depositing thin films with unique electrical, optical, and magnetic properties. The combination of indium and iron oxide offers a versatile material for various advanced applications, such as magnetic sensors, spintronic devices, and optoelectronic components. InFe₂O₄ thin films exhibit both semiconducting and magnetic behavior, making them ideal for devices that require the coupling of electric and magnetic fields. The high purity of InFe₂O₄ sputter targets ensures uniform deposition, which is essential for achieving the desired film properties and optimal performance in applications like memory storage, gas sensors, and energy harvesting devices.

    Properties of Indium Iron Oxide

    The table below presents the properties of Indium Iron Oxide.

    PropertiesDetails
    AppearanceSolid/Circular, disc, and rectangular.
    Molar Mass287.57g/mol
    Thermal Conductivity0.5 W/m·K 
    Melting Point> 1300°C

    Applications

    1. InFe₂O₄ sputter targets are taken to make transparent conductive films for devices in touch panels, displays, and solar cells. 
    2. The material is applied in the magnetic sensors and magnetic field detecting components due to its magnetic characteristics. 
    3. InFe₂O₄ thin films are applied in spintronic devices, which use electron spin to store and process data.
    4. Because of its sensibility, it is used in gas sensors to detect CO and NO₂ gases. 
    5. InFe₂O₄ thin films are utilized in optoelectronics, such as photodetectors and LEDs. They have good optical and electrical properties. 
    6. It enhances conductivity and charge storage properties in applications like batteries and supercapacitors.
    7. InFe₂O₄ sputter targets are used for catalytic purposes in chemical reactions, particularly to exploit the material’s mixed metal oxide properties.
    8. This material is also used to prepare magnetic coatings that require both magnetic and conductive properties.

    FAQs

    Queston: What gases can InFe₂O₄ thin films detect?

    Answere: InFe₂O₄ films are commonly used in gas sensors to detect gases like carbon monoxide (CO) and nitrogen dioxide (NO₂) with high sensitivity and selectivity.

    Queston: What are InFe₂O₄ sputter targets used for?

    Answere: InFe₂O₄ sputter targets help create thin films, which are used as transparent conductive coatings, magnetic sensors, spintronic devices, gas sensors, and energy storage devices.

    Queston: What is the typical deposition rate for InFe₂O₄ sputtering?

    Answere: The deposition rate varies depending on sputtering conditions (e.g., power, pressure, and target-substrate distance) but typically ranges from 0.1 to 1 micron per hour.

    1 review for Indium Iron Oxide, InFe2O4

    1. sachin

      Effective Product

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