| Catalogue Code | IN-CuLa-01 IN-CuLa-02 |
| CAS No. | 12053-92-8 |
| Chemical Formula | La2CuO4 |
| Compound Name | Lanthanum Copper Oxide |
| Purity (%) | >99.9 |
| Dimensions | Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25” |
Introduction
The Lanthanum Copper Oxide sputtering target, with the chemical formula La2CuO4, contains lanthanum, copper, and oxygen. High-purity lanthanum copper oxide sputter targets are essential in deposition procedures to ensure high-quality deposited films. Lanthanum Copper Oxide (La₂CuO₄) is a widely studied perovskite material, particularly notable for its role in high-temperature superconductivity. In thin film deposition, La₂CuO₄ sputtering targets are pivotal for creating high-quality, epitaxial thin films used in advanced electronic and functional materials research.
Properties
The table below contains all the critical properties of Lanthanum Copper Oxide :
| Properties | Description |
| Appearance and Shape | Solid, Thin film, Disc |
| Molar mass | ~ 365.805 g/mol |
| Magnetic Type | Antiferromagnetic |
| Density | ~ 6.5 g/cm³ |
| Thermal conductivity | ~ 2–5 W/m·K at room temperature |
| Melting Point | Decomposes before melting |
Application
Here are the critical applications of Lanthanum Copper Oxide (La₂CuO₄):
- High-temperature superconductor (HTS) Films: Deposition of thin films for studying superconductivity.
- Oxide Electronics: Fabrication of electronic devices that exploit its unique electronic properties.
- Thin Film Research: Development of heterostructures and multilayered oxide materials.
- Material Doping Studies: Exploration of doping effects (e.g., Sr or Ba doping) for tuning physical properties.
- Spintronics: Investigating spin dynamics and magnetic interactions in oxide materials.
- Research in Quantum Materials: A model compound for studying electronic behavior in correlated electron systems and quantum materials.
FAQs
Answere: La₂CuO₄ hitherto fabricates thin films in research on high-temperature superconductors, electronic devices, and oxide-based materials.
Answere: Depending on the desired film properties, la₂CuO₄ targets are compatible with RF magnetron sputtering and pulsed DC sputtering.
Answere: Typical conditions include a substrate temperature of 600-800°C, oxygen/argon gas mixtures, and 5-20 mTorr pressures. These may vary based on film requirements.
Answere: Handle targets with care to avoid chipping. Store them properly in a dry, clean environment to prevent contamination and maintain sputtering performance.
Answere: Yes, annealing in an oxygen atmosphere is often performed to enhance crystallinity and optimize superconducting or electronic properties.
sachin
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