Lanthanum Ferrite, LaFeO3

Purity (%) :>99.9
Dimensions :Dia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”
(1 customer review)
Get free material Sample

    group

    Get free material Sample

    price and cart logos
    Catalogue CodeIN-FeLa-01 IN-FeLa-02
    CAS No.123273-09-6
    Chemical FormulaLaFeO3
    Compound NameLanthanum Ferrite
    Purity (%)>99.9
    DimensionsDia. 1”, Thick. 0.125” Dia. 2”, Thick. 0.25”

    Introduction

    Lanthanum ferrite (LaFeO₃) is a ceramic perovskite material with a unique combination of magnetic, electrical, and structural properties, making it an ideal candidate for various thin-film applications. High-purity lanthanum ferrite sputter targets play a considerable role in deposition processes to ensure high-quality deposited film. When used as a sputtering target, LaFeO₃ is primarily valued for its ability to produce films with distinct characteristics such as high resistivity, magnetic behavior, and the potential for integration into complex oxide electronics.

    Properties

    The table below contains all the critical properties of Lanthanum ferrite : 

    PropertiesDescription
    Appearance and ShapeSolid, Thin film, Disc, or rectangular
    Molar mass221.77 g/mol
    Magnetic TypeAntiferromagnetic
    Thermal conductivity ~2.5 W/m·K at room temperature

    Applications

    Here are the critical applications of Lanthanum Ferrite (LaFeO₃):

    • Thin Film Electronics: Used to deposit conducting oxide layers for sensors, transistors, and capacitors.
    • Spintronic Devices: LaFeO₃ is utilized in spintronic devices because of its ferromagnetic properties, which enable applications in magnetic storage, sensors, and memory devices.
    • Multiferroic Materials: Thin films of LaFeO₃ are crucial in the development of multiferroic materials that exhibit both magnetic and ferroelectric properties, which will benefit next-generation memory and sensing devices.
    • Electromagnetic Interference Shielding: Its magnetic properties make it suitable for thin films used in electromagnetic shielding applications, protecting against interference in sensitive electronic circuits.
    • Dielectric Materials: LaFeO₃ thin films, due to their high dielectric constant, are used in capacitors and other electronic components requiring stable, high-performance materials.
    • Oxygen Sensing: LaFeO₃ thin films exhibit sensitivity to oxygen concentrations, making them useful in oxygen sensors and environmental and industrial monitoring systems.

    FAQs

    Queston: What is La₂CuO₄ used for in sputtering?

    Answere: La₂CuO₄ hitherto fabricates thin films in research on high-temperature superconductors, electronic devices, and oxide-based materials.

    Queston: What sputtering methods are suitable for La₂CuO₄?

    Answere: Depending on the desired film properties, la₂CuO₄ targets are compatible with RF magnetron sputtering and pulsed DC sputtering.

    Queston: What are the standard sputtering parameters for La₂CuO₄?

    Answere: Typical conditions include a substrate temperature of 600-800°C, oxygen/argon gas mixtures, and 5-20 mTorr pressures. These may vary based on film requirements.

    Queston: What precautions are needed when handling La₂CuO₄ targets?

    Answere: Handle targets with care to avoid chipping. Store them properly in a dry, clean environment to prevent contamination and maintain sputtering performance.

    Queston: 5) Can La₂CuO₄ thin films be annealed post-deposition?

    Answere: Yes, annealing in an oxygen atmosphere is often performed to enhance crystallinity and optimize superconducting or electronic properties.

    1 review for Lanthanum Ferrite, LaFeO3

    1. sachin

      Nice product !!!

    Add a review

    Your email address will not be published. Required fields are marked *