High Purity Sputtering Targets and Materials | USA Manufacturer & B2B Supplier – Infinita Materials

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Overview

Sputtering is widely used to deposit thin films with controlled thickness and composition. While deposition equipment and process settings matter, target quality also directly affects process consistency and the film produced.

Infinita Materials supplies sputtering targets for semiconductor research, electronics, optical coatings, sensors, energy devices, functional coatings, and other thin film applications. Our target materials cover a wide range of oxide and ceramic compositions, including ferrites, titanates, zirconates, and doped materials.

We have more than 100 target compositions available and can also work with customers who need a material not in a standard catalogue. This is useful for research projects where the target composition needs to be adjusted during material development.

Materials We Supply

Our sputtering target range includes zirconium oxide, barium zirconate, bismuth oxide, tungsten oxide, vanadium oxide, yttrium oxide, zinc oxide, zinc oxide with alumina, zinc oxide with gallium oxide, zinc oxide with magnesium, zinc oxide with manganese, and zinc oxide with scandia.

The portfolio also includes ferrites, titanates, manganates, cerium-based oxides, bismuth-based compounds, zirconates, and other speciality ceramic materials.

Different target materials can be used to investigate different film properties. Depending on the composition, researchers may be interested in electrical conductivity, dielectric behaviour, optical response, magnetic properties, catalytic activity, or sensing performance. Access to related compositions can also make it easier to compare materials during development.

Applications

Sputtering targets are used in physical vapour deposition to create thin films on a wide range of substrates. The process is used in semiconductor and electronics research, optical coatings, sensors, energy devices, dielectric films, magnetic materials, and functional oxide research.

The target is the source of the material that becomes the deposited film, so its composition needs to be well controlled. This becomes even more important when working with doped or multicomponent materials.

For example, adding a small amount of another element to an oxide can change its electrical, optical, structural, or magnetic behaviour. Researchers often use different dopant levels to find out how those changes affect the final film.

Custom targets are also useful when a research project involves a composition that is not normally available from a standard supplier.

Material Properties and Selection

Choosing a sputtering target starts with the film that needs to be deposited and the equipment being used. Target composition and purity matter, but they are not the only factors to consider.

Target density, homogeneity, dimensions, shape, and compatibility with the sputtering source can all affect target performance during deposition. For multicomponent ceramic targets, uniform composition is particularly important because variations within the target can lead to differences in the deposited material.

Target dimensions must also match the sputtering system and backing arrangement. For doped materials, the type and amount of dopant should be clearly defined before production, since even relatively small changes in composition can affect film properties.

If the required chemistry is unusual or the target specification is not yet finalised, our team can discuss the application and help work through the material requirements before manufacturing.

Custom Manufacturing

Not every thin film research project can use a standard sputtering target. Researchers may need a specific dopant concentration, a combination of several elements, or a ceramic formulation that is not available as a commercial target.

Infinita Materials can manufacture selected custom target compositions based on project requirements. Customers can provide the target chemistry, purity, dimensions, shape, quantity, and any other specifications that are important to their deposition process.

We can review the requested formulation and discuss the practical manufacturing requirements before production. This gives universities, research laboratories, and industrial development teams more flexibility when working with new or less common thin film materials.

Why Choose Infinita Materials

Infinita Materials offers one of the broadest product ranges within our materials portfolio through the sputtering target category. Customers can choose from more than 100 listed products and discuss custom compositions when the catalogue does not include the exact material required.

We focus on high-purity materials, target density, composition control, homogeneity, and customisation. Our broader expertise in ceramics, oxides, ferrites, titanates, zirconates, and functional materials also supports technically demanding target development.

We serve both research quantities and industrial material requirements, allowing customers to engage with our team at different stages of development.

Request a Sample or Quote

Send your sputtering target specifications to Infinita Materials. Include the material composition, purity requirement, dimensions, shape, quantity, intended deposition process, and any required doping information.

Our team can identify an existing target from our catalogue or review your requirements for custom manufacturing. Request a sample or quote for your thin film deposition program.

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Essential FAQs on Sputtering Targets Supplier and Manufacturer

What sputtering target materials does Infinita Materials supply?

We supply a broad range of oxide, ceramic, ferrite, titanate, zirconate, doped zinc oxide, and other speciality sputtering target compositions.

Can you manufacture custom sputtering targets?

Yes. We can review custom chemistry, doping, dimensions, shape, purity, and other target requirements for selected material systems.

What specifications should I provide for a sputtering target?

Provide the target composition, purity, dimensions, shape, quantity, deposition method, and any required dopant concentration or backing information.

Why do target density and homogeneity matter?

Target density and composition uniformity can influence sputtering behaviour, process stability, material utilisation, and the consistency of deposited films.

High-tech innovation, advanced techniques, and unparalleled quality from Infinita Materials.

Manufactured with advanced methods
High Purity, Density
Homogeneity
Customization

Advanced Ceramic Products

Infinita Materials offers advanced ceramic products that perform exceptionally well under extreme conditions. These materials stand apart through superior thermal stability, high wear resistance, and electrical insulation properties. Unlike traditional ceramics, they are engineered for advanced applications in aerospace, semiconductor, and medical industries, ensuring durability, precision, and reliability in demanding environments.

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Commitment to Quality

Infinita Materials stands out through its unwavering Commitment to Quality, delivering materials of exceptional purity and performance. These materials use advanced manufacturing techniques explicitly designed for the semiconductor industry to ensure superior compatibility, homogeneity, and consistency. Trusted by engineers and researchers, they are pivotal in driving innovation in research and development, enhancing the impact and efficiency of electronics, chips, semiconductors, and testing processes.

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Custom Manufacturing

Infinita Materials specializes in custom manufacturing ceramic materials, providing tailored solutions to meet the unique requirements of various industries. Customization includes optimized particle size distribution, surface area, reproducibility, and homogeneity. Our advanced manufacturing techniques ensure consistent quality, durability, thermal performance, and precision. By delivering ceramics that meet specific needs, we support industries with high-performing materials designed for reliability and efficiency.

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